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公开(公告)号：US11830737B2
公开(公告)日：2023-11-28
申请号：US17520634
申请日：2021-11-06
发明人： Hanhum Park , Insung Kim , Woojeong Shin , Jung-Hoon Lee , Sanghyeon Kim , Ji Young Choi
IPC分类号： H01L21/033
CPC分类号： H01L21/0338 , H01L21/0335 , H01L21/0337
摘要： Disclosed are semiconductor device fabricating method and semiconductor device fabricated by the same. The method includes forming on a lower mask layer first upper mask patterns and sacrificial spacers that cover sidewalls of the first upper mask patterns, forming first holes in the lower mask layer below the first upper mask patterns, forming second holes in the lower mask layer not covered by the first upper mask patterns and the sacrificial spacers, forming second upper mask patterns filling a space between the sacrificial spacers on the lower mask layer and also forming sacrificial patterns filling the first and second holes, removing the sacrificial spacers, using the first and second upper mask patterns to etch the lower mask layer, and removing the sacrificial patterns.
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公开(公告)号：US11778719B2
公开(公告)日：2023-10-03
申请号：US16927050
申请日：2020-07-13
发明人： Dohyung Kim , Seongchul Hong , Kyungsik Kang , Insung Kim , Motoshi Sakai , Seulgi Lee , Jungchul Lee
CPC分类号： H05G2/008 , G02B19/0047 , G02B26/0816 , G02B26/0875 , H01S3/0071 , H01S3/2316
摘要： A laser beam delivery apparatus of an extreme ultra violet light source may include a high power seed module configured to generate a laser beam, a power amplifier configured to amplify the laser beam generated by the high power seed module, a beam transfer module configured to collect and move the laser beam amplified by the power amplifier, a final focusing assembly optical platform configured to adjust focus of the laser beam collected and moved by the beam transfer module, and a focusing unit configured to focus the laser beam with the focus adjusted by the final focusing assembly optical platform to a target droplet. The power amplifier may include a position adjuster configured to adjust a position of the laser beam. The position adjuster may include a refraction plate having a flat surface. The power amplifier may include a pointing adjuster, which may include a mirror.
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公开(公告)号：US11700005B2
公开(公告)日：2023-07-11
申请号：US17509540
申请日：2021-10-25
发明人： Kangyeop Choo , Insung Kim , Wooseok Kim , Taeik Kim , Sunghyuck Lee , Chanyoung Jeong
CPC分类号： H03L7/0891 , H03L7/101
摘要： A phased locked loop includes; a load circuit that generates an output signal in response to a driving voltage, a frequency calibration circuit that generates a calibration signal in response to an output frequency of the output signal and a target frequency, and a regulator that generates the driving voltage in response to the calibration signal.
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公开(公告)号：US10126642B2
公开(公告)日：2018-11-13
申请号：US15285543
申请日：2016-10-05
发明人： Insung Kim , Seongsue Kim
摘要： Provided is a reflective photomask including a substrate, and a reflective layer formed on the substrate. The reflective layer includes at least one recessed portion. An absorbing layer is formed in the recessed portion. The absorbing layer includes at least one absorbent and at least one polymer.
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公开(公告)号：US09996001B2
公开(公告)日：2018-06-12
申请号：US15262447
申请日：2016-09-12
发明人： Insung Kim , SeongSue Kim
CPC分类号： G03F1/62 , G03F7/70708 , G03F7/70916 , G03F7/70933
摘要： A reticle including a mask and an edge cover may be provided. The mask may include a mask substrate and mask patterns on the mask substrate. The edge cover may be coupled to an edge of the mask substrate and may include a floating cover part. The floating cover part may be spaced apart from the mask patterns while extending from a sidewall of the mask substrate over the mask patterns.
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公开(公告)号：US20140319387A1
公开(公告)日：2014-10-30
申请号：US14105654
申请日：2013-12-13
发明人： Hoyeon Kim , Insung Kim , Jinho Jeon
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , G03F7/70916 , H05G2/008
摘要： An extreme ultraviolet light (EUL) source device is disclosed, the device comprising: a chamber in which a gas flow and a droplet stream are provided; a droplet generator through which target material is changed into the droplet stream; and a shroud positioned along the droplet stream, the shroud shielding the droplet stream from the gas flow, wherein the droplet stream is irradiated by laser to produce plasma and generate an extreme ultraviolet light. The shroud includes flow guide surface features that guide accumulated target material away from a collector mirror that reflects and focuses the EUL.
摘要翻译： 公开了一种极紫外光（EUL）源装置，该装置包括：设置有气流和液滴流的室; 目标材料通过该液滴发生器变成液滴流; 以及沿着液滴流定位的护罩，所述护罩屏蔽来自所述气流的液滴流，其中所述液滴流被激光照射以产生等离子体并产生极紫外光。 护罩包括引导表面特征，其引导累积的目标材料远离反射和聚焦EUL的收集器反射镜。
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公开(公告)号：US20240251496A1
公开(公告)日：2024-07-25
申请号：US18628152
申请日：2024-04-05
发明人： Dohyung Kim , Seongchul Hong , Insung Kim , Jinhong Park , Jungchul Lee
IPC分类号： H05G2/00 , G03F7/00 , H01L21/268
CPC分类号： H05G2/008 , H01L21/268 , G03F7/70033
摘要： Disclosed are semiconductor manufacturing apparatuses and operating methods thereof. The semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. The seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. The pulse control optical system is on the second path that does not overlap the first path. The third optical element includes a lens between the first optical element and the second optical element.
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公开(公告)号：US09857690B2
公开(公告)日：2018-01-02
申请号：US15182926
申请日：2016-06-15
发明人： Hoyeon Kim , Jinseok Heo , Insung Kim
CPC分类号： G03F7/70033 , G02B19/0095 , G03F7/70916 , H05G2/001
摘要： An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.
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公开(公告)号：US11979973B2
公开(公告)日：2024-05-07
申请号：US17163945
申请日：2021-02-01
发明人： Dohyung Kim , Seongchul Hong , Insung Kim , Jinhong Park , Jungchul Lee
IPC分类号： H05G2/00 , G03F7/00 , H01L21/268
CPC分类号： H05G2/008 , H01L21/268 , G03F7/70033
摘要： Disclosed are semiconductor manufacturing apparatuses and operating methods thereof. The semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. The seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. The pulse control optical system is on the second path that does not overlap the first path. The third optical element includes a lens between the first optical element and the second optical element.
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公开(公告)号：US20210385932A1
公开(公告)日：2021-12-09
申请号：US17163945
申请日：2021-02-01
发明人： Dohyung Kim , Seongchul Hong , Insung Kim , Jinhong Park , Jungchul Lee
IPC分类号： H05G2/00 , H01L21/268
摘要： Disclosed are semiconductor manufacturing apparatuses and operating methods thereof. The semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. The seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. The pulse control optical system is on the second path that does not overlap the first path. The third optical element includes a lens between the first optical element and the second optical element.
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