- 专利标题: Method for manufacturing silicon carbide semiconductor apparatus, and energization test apparatus
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申请号: US14772304申请日: 2014-03-10
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公开(公告)号: US09874596B2公开(公告)日: 2018-01-23
- 发明人: Shoyu Watanabe , Akihiro Koyama , Shigehisa Yamamoto , Yukiyasu Nakao , Kazuya Konishi
- 申请人: MITSUBISHI ELECTRIC CORPORATION
- 申请人地址: JP Chiyoda-ku
- 专利权人: MITSUBISHI ELECTRIC CORPORATION
- 当前专利权人: MITSUBISHI ELECTRIC CORPORATION
- 当前专利权人地址: JP Chiyoda-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2013-055838 20130319
- 国际申请: PCT/JP2014/056165 WO 20140310
- 国际公布: WO2014/148294 WO 20140925
- 主分类号: G01R31/26
- IPC分类号: G01R31/26 ; H01L21/66 ; H01L29/16 ; H01L29/32 ; H01L29/66 ; H01L29/78 ; G01R31/28 ; H01L21/56
摘要:
The present invention provides a method for manufacturing silicon carbide semiconductor apparatus including a testing step of testing a PN diode for the presence or absence of stacking faults in a relatively short time and an energization test apparatus. The present invention sets the temperature of a bipolar semiconductor element at 150° C. or higher and 230° C. or lower, causes a forward current having a current density of 120 [A/cm2] or more and 400 [A/cm2] or less to continuously flow through the bipolar semiconductor element, calculates, in a case where a forward resistance of the bipolar semiconductor element through which the forward current flows reaches a saturation state, the degree of change in the forward resistance, and determines whether the calculated degree of change is smaller than a threshold value.
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