Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US15070320Application Date: 2016-03-15
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Publication No.: US09882061B2Publication Date: 2018-01-30
- Inventor: Shunpei Yamazaki , Satoshi Toriumi , Takashi Hamada
- Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., LTD.
- Current Assignee: Semiconductor Energy Laboratory Co., LTD.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2015-052820 20150317; JP2015-120925 20150616
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H01L21/477 ; H01L29/786 ; H01L29/66 ; H01L29/04 ; H01L21/02 ; H01L23/528 ; H01L23/522 ; H01L27/12 ; H01L27/146

Abstract:
A transistor with favorable electrical characteristics is provided. A minute transistor is provided. Provided is a semiconductor device including a first insulator over a substrate, a second insulator over the first insulator, a semiconductor over the second insulator, a first conductor and a second conductor over the semiconductor, a third insulator over the semiconductor, a fourth insulator over the third insulator, a third conductor over the fourth insulator, and a fifth insulator over the first insulator, the first conductor, and the second conductor. In the semiconductor device, the second insulator and the third insulator each include at least one element other than oxygen included in the semiconductor, respectively, and the semiconductor includes a region having a carbon concentration of 3×1018 atoms/cm3 or lower.
Public/Granted literature
- US20160276487A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2016-09-22
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