Invention Grant
- Patent Title: Wiring substrate and manufacturing method thereof
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Application No.: US13152419Application Date: 2011-06-03
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Publication No.: US09888558B2Publication Date: 2018-02-06
- Inventor: Akira Harao , Mototatsu Matsunaga , Yasuhiro Sugiura , Minoru Kubota
- Applicant: Akira Harao , Mototatsu Matsunaga , Yasuhiro Sugiura , Minoru Kubota
- Applicant Address: JP Tokyo
- Assignee: YAZAKI CORPORATION
- Current Assignee: YAZAKI CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-128185 20100603; JP2010-128186 20100603; JP2010-232538 20101015; JP2011-120793 20110530
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K1/02 ; H01R12/72 ; H05K3/36 ; H05K1/11 ; H05K3/10 ; H01L23/498 ; H05K7/10 ; H05K1/05 ; H05K3/20 ; H05K3/34 ; H05K1/14

Abstract:
A wiring substrate 11A includes a high heat radiation substrate 21 which has a high thermal conductive layer in which at least one of a front surface and a rear surface thereof is a mounting surface 21a for a variety of components; a connection terminal 31 which is extended from the high heat radiation substrate 21 and bent in a direction perpendicular to a surface of the high heat radiation substrate 21; and a heat radiation piece section 35 which is integrally installed to the connection terminal 31.
Public/Granted literature
- US20110299250A1 WIRING SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2011-12-08
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