Invention Grant
- Patent Title: Radial and thickness control via biased multi-port injection settings
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Application No.: US15450199Application Date: 2017-03-06
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Publication No.: US09892913B2Publication Date: 2018-02-13
- Inventor: Joe Margetis , John Tolle , Gregory Bartlett , Nupur Bhargava
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer LLP
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/02 ; C23C16/455
Abstract:
A gas distribution system is disclosed in order to obtain better film uniformity on a substrate in a cross-flow reactor. The better film uniformity may be achieved by an asymmetric bias on individual injection ports of the gas distribution system. The gas distribution may allow for varied tunability of the film properties.
Public/Granted literature
- US20170278707A1 RADIAL AND THICKNESS CONTROL VIA BIASED MULTI-PORT INJECTION SETTINGS Public/Granted day:2017-09-28
Information query
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