Invention Grant
- Patent Title: Stage positioning system and lithographic apparatus
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Application No.: US15115876Application Date: 2015-01-20
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Publication No.: US09897926B2Publication Date: 2018-02-20
- Inventor: Wilhelmus Henricus Theodorus Maria Aangenent , Lucas Franciscus Koorneef , Theo Anjes Maria Ruijl , Stanley Constant Johannes Martinus Van Den Berg , Stan Henricus Van Der Meulen , Jan Van Eijk , Pieter Hubertus Godefrida Wullms , Richard Henricus Adrianus Van Lieshout
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Shaw Pittman LLP
- Agent Pillsbury Winthrop
- Priority: EP14153404 20140131; EP14161344 20140324
- International Application: PCT/EP2015/050950 WO 20150120
- International Announcement: WO2015/113861 WO 20150806
- Main IPC: B64C17/06
- IPC: B64C17/06 ; F16M7/00 ; G03B27/58 ; G03B27/62 ; H02K41/02 ; G03F7/20 ; H01L21/68
Abstract:
A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.
Public/Granted literature
- US20170010543A1 STAGE POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS Public/Granted day:2017-01-12
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