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1.发明授权公开(公告)号：US10365567B2
公开(公告)日：2019-07-30
申请号：US15735956
申请日：2016-05-19
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Johannes Theodorus Hendrikus De Best , Wilhelmus Henricus Theodorus Maria Aangenent , Stan Henricus Van Der Meulen
Abstract: A control system configured to control a parameter of a dynamic system, wherein the parameter depends on an output signal. The control system comprises a set-point generator and a feedforward, wherein the set-point generator is arranged to provide a set-point signal to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter.
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公开(公告)号：US10747127B2
公开(公告)日：2020-08-18
申请号：US16326948
申请日：2017-08-11
Applicant: ASML Netherlands B.V.
Inventor： Frits Van Der Meulen , Erik Johan Arlemark , Hendrikus Herman Marie Cox , Martinus Agnes Willem Cuijpers , Joost De Hoogh , Gosse Charles De Vries , Paul Comé Henri De Wit , Sander Catharina Reinier Derks , Ronald Cornelis Gerardus Gijzen , Dries Vaast Paul Hemschoote , Christiaan Alexander Hoogendam , Adrianus Hendrik Koevoets , Raymond Wilhelmus Louis Lafarre , Alain Louis Claude Leroux , Patrick Willem Paul Limpens , Jim Vincent Overkamp , Christiaan Louis Valentin , Koos Van Berkel , Stan Henricus Van Der Meulen , Jacobus Cornelis Gerardus Van Der Sanden , Harmen Klaas Van Der Schoot , David Ferdinand Vles , Evert Auke Rinze Westerhuis
IPC: G03F7/20
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号：US11828344B2
公开(公告)日：2023-11-28
申请号：US17633000
申请日：2020-07-09
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Johan Maarten Van De Wijdeven , Johannes Petrus Martinus Bernardus Vermeulen , Jeroen Pieter Starreveld , Stan Henricus Van Der Meulen
CPC classification number: F16F15/022 , F16F13/005 , G03F7/709 , G03F7/70833 , F16F2222/08
Abstract: The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral member that extends between the first and second end portions in a circumferential direction of the support, and a second spiral member that extends between the first and second end portions in a circumferential direction of the support. The first and second spiral members extend in the longitudinal direction around a longitudinal axis of the support, wherein the first spiral member of the coil spring and the second spiral member of the coil spring are moveable relative to each other, and wherein the support further comprises a damper device that is attached to the first spiral member.
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Patent Agency Ranking
公开(公告)号：US10705438B2
公开(公告)日：2020-07-07
申请号：US16716568
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US20200117097A1
公开(公告)日：2020-04-16
申请号：US16716568
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US10571814B2
公开(公告)日：2020-02-25
申请号：US16318191
申请日：2017-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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7.发明授权公开(公告)号：US10401743B2
公开(公告)日：2019-09-03
申请号：US15735956
申请日：2016-05-19
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Johannes Theodorus Hendrikus De Best , Wilhelmus Henricus Theodorus Maria Aangenent , Stan Henricus Van Der Meulen
Abstract: A control system configured to control a parameter of a dynamic system, wherein the parameter depends on an output signal. The control system comprises a set-point generator and a feedforward, wherein the set-point generator is arranged to provide a set-point signal to the feedforward. The feedforward is arranged to provide the output signal based on the set-point signal, wherein the feedforward is arranged to perform a non-linear operation on the set-point signal. The non-linear operation is based on a non-linear functional relationship between the output signal and the parameter.
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公开(公告)号：US09897926B2
公开(公告)日：2018-02-20
申请号：US15115876
申请日：2015-01-20
Applicant: ASML Netherlands B.V.
Inventor： Wilhelmus Henricus Theodorus Maria Aangenent , Lucas Franciscus Koorneef , Theo Anjes Maria Ruijl , Stanley Constant Johannes Martinus Van Den Berg , Stan Henricus Van Der Meulen , Jan Van Eijk , Pieter Hubertus Godefrida Wullms , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70716 , G03F7/70758 , G03F7/709 , H01L21/68
Abstract: A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.
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