Disclosed are methods, systems and computer program products that, during new technology node development, perform design rule and process assumption co-optimization using feature-specific layout-based statistical analyses. Specifically, the layout of a given feature can be analyzed to determine whether it complies with all of the currently established design rules in the new technology node. When the layout fails to comply with a current design rule, statistical analyses (e.g., Monte-Carlo simulations) of images, which are generated based on the layout and which illustrate different tolerances for and between the various shapes in the layout given current process assumption(s), can be performed. Based on the results of the analyses, the current process assumption(s) and/or the design rule itself can be adjusted using a co-optimization process in order to ensure the manufacturability of the feature within the technology.