Invention Grant
- Patent Title: Arc-ablation resistant switch contact and preparation method thereof
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Application No.: US15318042Application Date: 2015-07-15
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Publication No.: US09905376B2Publication Date: 2018-02-27
- Inventor: Huisheng Han , Zhenxing Wang , Yang Ding , Hongmei Zhang
- Applicant: NANTONG MEMTECH TECHNOLOGIES CO., LTD.
- Applicant Address: CN Nantong, Jiangsu
- Assignee: Nantong Memtech Technologies Co., Ltd.
- Current Assignee: Nantong Memtech Technologies Co., Ltd.
- Current Assignee Address: CN Nantong, Jiangsu
- Agency: Rankin, Hill & Clark LLP
- Priority: CN201410346964 20140721
- International Application: PCT/CN2015/084168 WO 20150715
- International Announcement: WO2016/011912 WO 20160128
- Main IPC: H01H1/021
- IPC: H01H1/021 ; H01H11/04 ; H01H11/06 ; C23C18/16 ; C23C18/18 ; C23C18/36 ; C23C18/50 ; C23C18/52 ; C23C18/48 ; C25D3/14 ; C25D3/56 ; C25D7/00

Abstract:
An arc-ablation resistant switch contact and a preparation method thereof is disclosed. The switch contact is a complex having a plurality of layers of layered structure, wherein a first layer is a hydrophobic rubber layer, a second layer is an adhesive layer, a third layer is a sheet metal layer, a fourth layer is an adhesive layer, and a fifth layer is a metal plated layer; wherein, the fifth layer of metal plated layer is formed by dipping a complex of the first layer, the second layer, the third layer and the fourth layer in a chemical plating bath containing refractory metal elements, and depositing on surfaces of the second layer, the third layer and the fourth layer in the complex by a chemical deposition method.
Public/Granted literature
- US20170125179A1 ARC-ABLATION RESISTANT SWITCH CONTACT AND PREPARATION METHOD THEREOF Public/Granted day:2017-05-04
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