Invention Grant
- Patent Title: Image sensors using different photoconversion region isolation structures for different types of pixel regions
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Application No.: US15290560Application Date: 2016-10-11
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Publication No.: US09911777B2Publication Date: 2018-03-06
- Inventor: Kyungho Lee , Seounghyun Kim , Hyuk An , Yun Ki Lee , Hyuk Soon Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Ward and Smith, P.A.
- Priority: KR10-2015-0142310 20151012
- Main IPC: H01L31/062
- IPC: H01L31/062 ; H01L27/146

Abstract:
An image sensor includes a semiconductor substrate, a first pair of photoelectric conversion regions in a first pixel region of the substrate and a first isolation structure between the photoelectric conversion regions of the first pair of photoelectric conversion regions. The sensor further includes a second pair of photoelectric conversion regions in a second pixel region of the substrate adjacent the first pixel region and a second isolation structure between the photoelectric conversion regions of the second pair of photoelectric conversion regions and having different optical properties than the first isolation structure. First and second different color filters (e.g., green and red) may be disposed on respective ones of the first and second pixel regions.
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