- 专利标题: Electroless metallization of dielectrics with alkaline stable pyrazine derivative containing catalysts
-
申请号: US14477855申请日: 2014-09-04
-
公开(公告)号: US09918389B2公开(公告)日: 2018-03-13
- 发明人: Feng Liu , Maria Rzeznik
- 申请人: Rohm and Haas Electronic Materials LLC
- 申请人地址: US MA Marlborough
- 专利权人: Rohm and Haas Electronic Materials LLC
- 当前专利权人: Rohm and Haas Electronic Materials LLC
- 当前专利权人地址: US MA Marlborough
- 代理商 John J. Piskorski
- 主分类号: C23C18/40
- IPC分类号: C23C18/40 ; H05K3/18 ; C23C18/30 ; C23C18/34 ; C23C18/50 ; C23C18/16 ; B01J31/22
摘要:
Pyrazine derivatives which contain one or more electron donating groups on the ring are used as catalytic metal complexing agents in aqueous alkaline environments to catalyze electroless metal plating on metal clad and un-clad substrates. The catalysts are monomers and free of tin and antioxidants.
公开/授权文献
信息查询
IPC分类: