- 专利标题: Physically aware test patterns in semiconductor fabrication
-
申请号: US15203954申请日: 2016-07-07
-
公开(公告)号: US09922163B2公开(公告)日: 2018-03-20
- 发明人: William V. Huott , Kevin M. McIvain , Samir K. Patel , Gary A. Van Huben
- 申请人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 代理机构: Cantor Colburn LLP
- 代理商 William A. Kinnaman, Jr.
- 主分类号: G06F9/455
- IPC分类号: G06F9/455 ; G06F17/50
摘要:
A method for fabricating a circuit comprises identifying a target on the circuit with a transitional sensitivity, determining a test pattern that stresses the target, generating a verification model at the hierarchy of the target, creating a pattern and translating the pattern into a verification assertion, running the verification with the translated pattern, determining whether the verification assertion is a possible verification assertion following the running of the verification, obtaining a state of source latches and pin inputs responsive to determining that the formal verification assertion is a possible verification assertion following the running of the formal verification, translating the formal verification assertion into a coverage event, running a simulation with the coverage event, determining whether the coverage event occurred, and creating a manufacturing test responsive to determining that the coverage event occurred.
公开/授权文献
信息查询