- Patent Title: Thin film transistor substrate and method of manufacturing the same
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Application No.: US15006295Application Date: 2016-01-26
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Publication No.: US09929191B2Publication Date: 2018-03-27
- Inventor: Sang-Ho Park , Su-Hyoung Kang , Dong-Hwan Shim , Yoon-Ho Khang , Se-Hwan Yu , Min-Jung Lee , Yong-Su Lee
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Cantor Colburn LLP
- Priority: KR10-2012-0087597 20120810
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L27/12 ; H01L29/66 ; H01L21/28

Abstract:
A thin film transistor substrate includes a base substrate, an active pattern disposed on the base substrate, a gate insulation pattern disposed on the active pattern, a gate electrode disposed on the gate insulation pattern and overlapping the channel, and a light-blocking pattern disposed between the base substrate and the active pattern and having a size greater than the active pattern. The active pattern includes a source electrode, a drain electrode, and a channel disposed between the source electrode and the drain electrode.
Public/Granted literature
- US20160141310A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2016-05-19
Information query
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