- Patent Title: Field effect transistor and semiconductor device including the same
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Application No.: US15340199Application Date: 2016-11-01
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Publication No.: US09941360B2Publication Date: 2018-04-10
- Inventor: Shigenobu Maeda , Seunghan Seo , Yeohyun Sung
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-Si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-Si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2015-0170784 20151202
- Main IPC: H01L29/165
- IPC: H01L29/165 ; H01L29/16 ; H01L29/04 ; H01L29/08 ; H01L29/10 ; H01L29/20 ; H01L29/22 ; H01L29/78 ; H01L29/267 ; H01L29/778 ; H01L29/786 ; H01L29/24 ; H01L29/51

Abstract:
A field effect transistor and a semiconductor device including the same are provided. The semiconductor device may include a channel layer, which is provided on a substrate and includes a two-dimensional atomic layer made of a first material, and a source/drain layer, which is provided on the substrate and includes a second material. The first material may be one of phosphorus allotropes, the second material may be one of carbon allotropes, and the channel layer and the source/drain layer may be connected to each other by covalent bonds between the first and second materials.
Public/Granted literature
- US20170162654A1 FIELD EFFECT TRANSISTOR AND SEMICONDUCTOR DEVICE INCLUDING THE SAME Public/Granted day:2017-06-08
Information query
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