Invention Grant
- Patent Title: Spacer and manufacturing device for the same
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Application No.: US14888418Application Date: 2015-09-25
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Publication No.: US09946154B2Publication Date: 2018-04-17
- Inventor: Huan Liu , Zui Wang , Jinbo Guo , Shih-hsun Lo
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Priority: CN201510583558 20150914
- International Application: PCT/CN2015/090812 WO 20150925
- International Announcement: WO2017/045225 WO 20170323
- Main IPC: G03F1/70
- IPC: G03F1/70 ; G03F1/36 ; G03F7/00 ; G03F1/78 ; G03F7/20 ; G02F1/1339

Abstract:
A spacer manufacturing device is disclosed. The device includes a photo mask having a central light-transmitting region and a peripheral light-transmitting region disposed at a periphery of the central light-transmitting region; and an exposure device right opposite to the photo mask. Wherein, light emitted from the exposure device is irradiated to a negative photoresist material after passing through the photo mask, the light intensity passing through the peripheral light-transmitting region is less than the light intensity passing through the central light-transmitting region. A spacer is also disclosed. Only one exposure process is required to realize the spacer having a convex-shaped cross section. The process is simple and the manufacturing cost is low. At the same time, a flatness of the convex shoulder of the spacer having a convex-shaped cross section is adjustable, which can satisfy the requirement for manufacturing spacers having different specifications.
Public/Granted literature
- US20170160634A1 SPACER AND MANUFACTURING DEVICE FOR THE SAME Public/Granted day:2017-06-08
Information query
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