Invention Grant
- Patent Title: Nano vacuum gap device with a gate-all-around cathode
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Application No.: US15098108Application Date: 2016-04-13
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Publication No.: US09953796B2Publication Date: 2018-04-24
- Inventor: Biqin Huang , Christopher S. Roper , Tahir Hussain
- Applicant: HRL Laboratories, LLC
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Ladas & Parry
- Main IPC: H01J1/62
- IPC: H01J1/62 ; H01J1/308 ; H01J1/304 ; H01J9/02 ; H01J21/10

Abstract:
A semiconductor power handling device, includes a cathode pillar, a gate surrounding the cathode pillar, and an anode spaced from the cathode by a nano-vacuum gap. An array of semiconductor power handling devices, each comprising a cathode pillar, a gate surrounding the cathode pillar, and an anode spaced from the cathode pillar by a nano-vacuum gap. The semiconductor power handling devices can be arranged as rows and columns and can be interconnected to meet the requirements of various applications. The array of power handling devices can be fabricated on a single substrate.
Public/Granted literature
- US20160307722A1 NANO VACUUM GAP DEVICE WITH A GATE-ALL-AROUND CATHODE Public/Granted day:2016-10-20
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