Pellicle for reticle and multilayer mirror

Invention Grant

US09989844B2 Pellicle for reticle and multilayer mirror 有权

Patent Title: Pellicle for reticle and multilayer mirror
Application No.: US15281056

Application Date: 2016-09-29
Publication No.: US09989844B2

Publication Date: 2018-06-05
Inventor: Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
Applicant: ASML NETHERLANDS B.V.
Applicant Address: NL Veldhoven
Assignee: ASML NETHERLANDS B.V.
Current Assignee: ASML NETHERLANDS B.V.
Current Assignee Address: NL Veldhoven
Agency: Pillsbury Winthrop Shaw Pittman LLP
Main IPC: G03F7/20
IPC: G03F7/20 ; G03F1/64 ; B82Y10/00 ; B82Y40/00 ; G02B5/08 ; G02B5/20 ; G02B27/00 ; G03F1/24 ; G03F1/62 ; G21K1/06 ; H01B1/04 ; H01B1/24 ; G03B27/54 ; C01B32/20

Abstract:

A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/20	.曝光及其设备（复制用照相印制设备入G03B27/00）