发明授权
- 专利标题： Methods and devices for selective deposition of materials including mechanical abrasion
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申请号： US14831679申请日： 2015-08-20
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公开(公告)号： US09995719B2公开(公告)日： 2018-06-12
- 发明人: Timothy M. Swager , Kelvin Mitchell Frazier , Katherine A. Mirica , Joseph Walish
- 申请人： Massachusetts Institute of Technology
- 申请人地址： US MA Cambridge
- 专利权人： Massachusetts Institute of Technology
- 当前专利权人： Massachusetts Institute of Technology
- 当前专利权人地址： US MA Cambridge
- 代理机构： Wolf, Greenfield & Sacks, P.C.
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; G01N33/00 ; B81C1/00
摘要：
Methods for depositing materials on patterned substrates, and related devices, are generally provided. In some embodiments, a material is deposited on a patterned substrate. In certain embodiments, the substrate comprises a first portion with a material deposited on the first portion and a second portion of the substrate essentially free of the material. The methods described herein may be useful in fabricating sensors, circuits, tags, among other devices. In some cases, devices for determining analytes are also provided.
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