METHODS AND DEVICES FOR DEPOSITION OF MATERIALS ON PATTERNED SUBSTRATES
    2.
    发明申请
    METHODS AND DEVICES FOR DEPOSITION OF MATERIALS ON PATTERNED SUBSTRATES 有权
    用于沉积图案材料的方法和装置

    公开(公告)号:US20160195504A1

    公开(公告)日:2016-07-07

    申请号:US14831679

    申请日:2015-08-20

    IPC分类号: G01N33/00

    摘要: Methods for depositing materials on patterned substrates, and related devices, are generally provided. In some embodiments, a material is deposited on a patterned substrate. In certain embodiments, the substrate comprises a first portion with a material deposited on the first portion and a second portion of the substrate essentially free of the material. The methods described herein may be useful in fabricating sensors, circuits, tags, among other devices. In some cases, devices for determining analytes are also provided.

    摘要翻译: 通常提供了在图案化基板上沉积材料的方法和相关装置。 在一些实施例中,材料沉积在图案化的衬底上。 在某些实施例中,衬底包括具有沉积在第一部分上的材料的第一部分和基本上不含该材料的衬底的第二部分。 本文描述的方法可用于制造传感器,电路,标签等装置。 在某些情况下,还提供了用于确定分析物的装置。