- 专利标题: Process tube for semiconductor device manufacturing apparatus
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申请号: US29204407申请日: 2004-04-29
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公开(公告)号: USD520467S1公开(公告)日: 2006-05-09
- 设计人: Katsutoshi Ishii , Hiroyuki Matsuura
- 申请人: Katsutoshi Ishii , Hiroyuki Matsuura
- 申请人地址: JP Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo
- 代理机构: Smith, Gambrell & Russell, LLP
- 优先权: JP2003-032507 20031104
- LOC分类号: 13-03