再颁专利
- 专利标题： Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer
- 专利标题（中）： 图案形成方法包括在辐射敏感层上形成酸性涂层
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申请号： US639973申请日： 1996-04-29
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公开(公告)号： USRE35821E公开(公告)日： 1998-06-09
- 发明人: Hirokazu Niki , Rumiko Hayase , Naohiko Oyasato , Yasunobu Onishi , Akitoshi Kumagae , Kazuo Sato , Masataka Miyamura , Yoshihito Kobayashi
- 申请人： Hirokazu Niki , Rumiko Hayase , Naohiko Oyasato , Yasunobu Onishi , Akitoshi Kumagae , Kazuo Sato , Masataka Miyamura , Yoshihito Kobayashi
- 申请人地址： JPX Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX3-324162 19911209; JPX4-244714 19920914
- 主分类号： G03F7/26
- IPC分类号： G03F7/26 ; G03F7/004 ; G03F7/039 ; G03F7/09 ; G03F7/11 ; G03F7/38 ; H01L21/027 ; G03C5/00
摘要：
A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.
公开/授权文献
- US5124603A Rotating rectifier assembly 公开/授权日：1992-06-23
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