公开(公告)号：US5403695A

公开(公告)日：1995-04-04

申请号：US876457

申请日：1992-04-30

申请人： Rumiko Hayase ,  Yasunobu Onishi ,  Hirokazu Niki ,  Naohiko Oyasato ,  Yoshihito Kobayashi ,  Shuzi Hayase

发明人： Rumiko Hayase ,  Yasunobu Onishi ,  Hirokazu Niki ,  Naohiko Oyasato ,  Yoshihito Kobayashi ,  Shuzi Hayase

IPC分类号： G03F7/023 ,  G03F7/039 ,  G03F7/30

CPC分类号： G03F7/0233 ,  G03F7/0392 ,  Y10S430/111 ,  Y10S430/146

摘要： Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.

摘要翻译： 本文公开了用于形成图案的抗蚀剂，其对于紫外线对电离辐射非常敏感，并且因此如果暴露于紫外线或组合辐射则可形成高分辨率抗蚀剂图案。 因此，抗蚀剂可用于制造具有高积分密度的半导体器件的方法。 抗蚀剂包括叔丁氧基羰基甲氧基聚羟基苯乙烯和邻醌二叠氮化合物。

公开(公告)号：US20080015720A1

公开(公告)日：2008-01-17

申请号：US11857699

申请日：2007-09-19

申请人： Naohiko Oyasato ,  Toshimitsu Kumazawa

发明人： Naohiko Oyasato ,  Toshimitsu Kumazawa

IPC分类号： G06F19/00

CPC分类号： G06Q10/10 ,  Y02W90/20

摘要： A design support apparatus includes an evaluation unit that evaluates a recyclability of the product, using evaluation condition and parts/material data, an analysis unit that analyzes a factor obstructing the recyclability based on an evaluation result of the evaluating unit, and a display unit that displays a remedy against an obstruction factor provided as an analysis result of the analysis unit.

摘要翻译： 一种设计支援装置，其特征在于，具有使用所述评价条件和零件/材料数据评价所述商品的可回收性的评价部，基于所述评价部的评价结果​​来分析妨碍所述可再生性的因素的分析部;以及显示部， 显示针对作为分析单元的分析结果提供的阻塞因子的补救措施。

公开(公告)号：USRE35821E

公开(公告)日：1998-06-09

申请号：US639973

申请日：1996-04-29

申请人： Hirokazu Niki ,  Rumiko Hayase ,  Naohiko Oyasato ,  Yasunobu Onishi ,  Akitoshi Kumagae ,  Kazuo Sato ,  Masataka Miyamura ,  Yoshihito Kobayashi

发明人： Hirokazu Niki ,  Rumiko Hayase ,  Naohiko Oyasato ,  Yasunobu Onishi ,  Akitoshi Kumagae ,  Kazuo Sato ,  Masataka Miyamura ,  Yoshihito Kobayashi

IPC分类号： G03F7/26 ,  G03F7/004 ,  G03F7/039 ,  G03F7/09 ,  G03F7/11 ,  G03F7/38 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/09 ,  G03F7/11 ,  G03F7/0045

摘要： A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.

摘要翻译： 一种辐射敏感层，其包含作为主要成分的含有当暴露于化学辐射时能够产生酸的化合物的辐射敏感性组合物和具有至少一个可被酸分解的键的化合物。 在辐射敏感层上形成酸性涂层。 辐射敏感层和酸性涂层图案暴露于化学辐射。 通过使用碱性水溶液来烘烤和显影辐射敏感层和酸性涂层，以获得每个具有预定宽度的线和间隔的图案。 可以形成矩形截面形状的精细图案，而不会在膜表面上产生由表面抑制层形成的檐。

公开(公告)号：US07340351B2

公开(公告)日：2008-03-04

申请号：US10607000

申请日：2003-06-27

申请人： Naohiko Oyasato ,  Toshimitsu Kumazawa

发明人： Naohiko Oyasato ,  Toshimitsu Kumazawa

IPC分类号： G01N31/00

CPC分类号： G06Q10/10 ,  Y02W90/20

摘要： A design support apparatus includes an evaluation unit that evaluates a recyclability of the product, using evaluation condition and parts/material data, an analysis unit that analyzes a factor obstructing the recyclability based on an evaluation result of the evaluating unit, and a display unit that displays a remedy against an obstruction factor provided as an analysis result of the analysis unit.

摘要翻译： 一种设计支援装置，其特征在于，具有使用所述评价条件和零件/材料数据评价所述商品的可回收性的评价部，基于所述评价部的评价结果​​来分析妨碍所述可再生性的因素的分析部;以及显示部， 显示针对作为分析单元的分析结果提供的阻塞因子的补救措施。

公开(公告)号：US5658706A

公开(公告)日：1997-08-19

申请号：US302319

申请日：1994-09-08

申请人： Hirokazu Niki ,  Hiromitsu Wakabayashi ,  Rumiko Hayase ,  Naohiko Oyasato ,  Yasunobu Onishi ,  Kazuo Sato ,  Kenji Chiba ,  Takao Hayashi

发明人： Hirokazu Niki ,  Hiromitsu Wakabayashi ,  Rumiko Hayase ,  Naohiko Oyasato ,  Yasunobu Onishi ,  Kazuo Sato ,  Kenji Chiba ,  Takao Hayashi

IPC分类号： C08K5/16 ,  C08L25/00 ,  C08L25/18 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/111

摘要： A resist composition for forming a pattern, which comprises (a) a compound represented by the following formula (1) and satisfying the following inequalities, ##STR1## wherein R.sup.1 is hydrogen atom or methyl group, R.sup.2 is a monovalent organic group, m is 0 or a positive integer, n is a positive integer, and m and n satisfying a condition of 0.03.ltoreq.n/(m+n).ltoreq.1, (b) a compound capable of generating an acid when irradiated with light, and (c) a nitrogen-containing compound, wherein a weight-average molecular weight, Mw and a number-average molecular weight, Mn satisfy the following inequality, 4,000.ltoreq.Mw.ltoreq.50,000, 1.10.ltoreq.Mw/Mn.ltoreq.2.50 (Mw and Mn respectively represent value converted in styrene).

摘要翻译： 用于形成图案的抗蚀剂组合物，其包含（a）由下式（1）表示的化合物并满足以下不等式，其中R 1是氢原子或甲基，R 2是一价有机基团 基团，m为0或正整数，n为正整数，m和n满足0.03≤n/（m + n）≤1的条件，（b）能够产生酸的化合物 当用光照射时，和（c）含氮化合物，其中重均分子量Mw和数均分子量Mn满足以下不等式：4,000

公开(公告)号：US07877157B2

公开(公告)日：2011-01-25

申请号：US11857699

申请日：2007-09-19

申请人： Naohiko Oyasato ,  Toshimitsu Kumazawa

发明人： Naohiko Oyasato ,  Toshimitsu Kumazawa

IPC分类号： G06F19/00 ,  B03B7/00 ,  B04B5/10 ,  B07B15/00 ,  B07C5/36

CPC分类号： G06Q10/10 ,  Y02W90/20

摘要： A design support apparatus includes an evaluation unit that evaluates a recyclability of the product, using evaluation condition and parts/material data, an analysis unit that analyzes a factor obstructing the recyclability based on an evaluation result of the evaluating unit, and a display unit that displays a remedy against an obstruction factor provided as an analysis result of the analysis unit.

摘要翻译： 一种设计支援装置，其特征在于，具有使用所述评价条件和零件/材料数据评价所述商品的可回收性的评价部，基于所述评价部的评价结果​​来分析妨碍所述可再生性的因素的分析部;以及显示部， 显示针对作为分析单元的分析结果提供的阻塞因子的补救措施。

公开(公告)号：US06332909B1

公开(公告)日：2001-12-25

申请号：US09142742

申请日：1999-02-23

申请人： Kouichi Teshima ,  Tomohiro Todoroki ,  Terunobu Hayata ,  Fuminobu Tezuka ,  Masao Koyama ,  Naohiko Oyasato ,  Tomiaki Furuya ,  Yoshiaki Yokoyama ,  Teruhisa Ogihara ,  Kaichiro Ogihara

发明人： Kouichi Teshima ,  Tomohiro Todoroki ,  Terunobu Hayata ,  Fuminobu Tezuka ,  Masao Koyama ,  Naohiko Oyasato ,  Tomiaki Furuya ,  Yoshiaki Yokoyama ,  Teruhisa Ogihara ,  Kaichiro Ogihara

IPC分类号： C22B700

CPC分类号： C10B7/14 ,  B09B3/00 ,  C10B53/07 ,  C22B7/001 ,  F23G2201/301 ,  F23G2201/50 ,  Y02P10/214 ,  Y02P20/143

摘要： A processing apparatus capable of separating and recovering resins and metals, respectively, from an object being processed, which has resins and metals as its constituent, comprises a first gastight area (102), in which temperature and pressure are regulated so as to permit selective thermal decomposition of resins from the object (150) being processed, a second gastight area (103), which is partitioned from the first gastight area by an openable and closeable partition (105C) and in which temperature and pressure are regulated so as to permit selective vaporization of metals from the object, first recovering chamber (111) connected to the first gastight area for recovering gases produced by thermal decomposition of resins, and second recovering chamber (115) connected to the second gastight area for recovering vaporized metals.

摘要翻译： 能够分别从具有树脂和金属作为其成分的被加工物分离和回收树脂和金属的加工设备包括第一气密区域（102），其中调节温度和压力以允许选择性 来自被加工物体（150）的树脂的热分解，第二气密区域（103），其通过可开闭的隔板（105C）从第一气密区域分隔开，并且其中温度和压力被调节以允许 从物体选择性蒸发金属，连接到第一气密区域的第一回收室（111）用于回收由树脂热分解产生的气体;以及第二回收室（115），其连接到第二气密区域以回收蒸发的金属。

公开(公告)号：US5744281A

公开(公告)日：1998-04-28

申请号：US848747

申请日：1997-05-01

申请人： Hirokazu Niki ,  Hiromitsu Wakabayashi ,  Rumiko Hayase ,  Naohiko Oyasato ,  Yasunobu Onishi ,  Kazuo Sato ,  Kenji Chiba ,  Takao Hayashi

发明人： Hirokazu Niki ,  Hiromitsu Wakabayashi ,  Rumiko Hayase ,  Naohiko Oyasato ,  Yasunobu Onishi ,  Kazuo Sato ,  Kenji Chiba ,  Takao Hayashi

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/111

摘要： A resist composition for forming a pattern, which comprises (a) a compound represented by the following formula (1) and satisfying the following inequalities, ##STR1## wherein R.sup.1 is hydrogen atom or methyl group, R.sup.2 is a monovalent organic group, m is 0 or a positive integer, n is a positive integer, and m and n satisfying a condition of 0.03.ltoreq.n/(m+n).ltoreq.1, (b) a compound capable of generating an acid when irradiated with light, and (c) 4-phenylpyridine, wherein a weight-average molecular weight, Mw and a number-average molecular weight, Mn satisfy the following inequality, 4,000.ltoreq.Mw.ltoreq.50,000, 1.10.ltoreq.Mw/Mn.ltoreq.2.50 (Mw and Mn respectively represent value converted in styrene).

摘要翻译： 用于形成图案的抗蚀剂组合物，其包含（a）由下式（1）表示的化合物并满足以下不等式，其中R 1是氢原子或甲基，R 2是一价有机基团 基团，m为0或正整数，n为正整数，m和n满足0.03≤n/（m + n）≤1的条件，（b）能够产生酸的化合物 当用光照射时，和（c）4-苯基吡啶，其中重均分子量Mw和数均分子量Mn满足以下不等式：4,000

公开(公告)号：US5518864A

公开(公告)日：1996-05-21

申请号：US220058

申请日：1994-03-30

申请人： Masayuki Oba ,  Rumiko Hayase ,  Naoko Kihara ,  Shuzi Hayase ,  Yukihiro Mikogami ,  Yoshihiko Nakano ,  Naohiko Oyasato ,  Shigeru Matake ,  Kei Takano

发明人： Masayuki Oba ,  Rumiko Hayase ,  Naoko Kihara ,  Shuzi Hayase ,  Yukihiro Mikogami ,  Yoshihiko Nakano ,  Naohiko Oyasato ,  Shigeru Matake ,  Kei Takano

IPC分类号： G03F7/023 ,  G03F7/038 ,  G03F7/38

CPC分类号： G03F7/0387 ,  G03F7/0233

摘要： Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1## where, R.sup.1 represents a tetravalent organic group, R.sup.2 represents a divalent organic group, and R.sup.3 and R.sup.4 represent a monovalent organic group, at least one of R.sup.3 and R.sup.4 being an organic group having at least on hydroxyl group bonded to an aromatic ring. A semiconductor substrate is coated with the photosensitive resin composition, followed by exposing the coated film to light through a patterning mask and subsequently applying a development and a heat treatment so as to form a polyimide film pattern. A baking treatment also be applied immediately after the exposure step. The photosensitive resin composition of the present invention performs the function of a positive or negative photoresist film and the function of a polyimide protective film on a semiconductor substrate.

摘要翻译： 公开了含有具有下述通式（1）表示的重复单元的聚酰胺酸衍生物和感光性化合物（1）的感光性树脂组合物，其中R1表示四价有机基团，R2表示二价有机基团 并且R 3和R 4表示一价有机基团，R 3和R 4中的至少一个是至少具有与芳环键合的羟基的有机基团。 用感光性树脂组合物涂布半导体基板，然后通过图案化掩模使涂膜曝光，随后进行显影和热处理，以形成聚酰亚胺膜图案。 在曝光步骤之后立即施加烘烤处理。 本发明的感光性树脂组合物在半导体基板上具有正性或负性光致抗蚀剂膜的功能和聚酰亚胺保护膜的功能。

公开(公告)号：US5348835A

公开(公告)日：1994-09-20

申请号：US766334

申请日：1991-09-27

申请人： Masayuki Oba ,  Rumiko Hayase ,  Naoko Kihara ,  Shuzi Hayase ,  Yukihiro Mikogami ,  Yoshihiko Nakano ,  Naohiko Oyasato ,  Shigeru Matake ,  Kei Takano

发明人： Masayuki Oba ,  Rumiko Hayase ,  Naoko Kihara ,  Shuzi Hayase ,  Yukihiro Mikogami ,  Yoshihiko Nakano ,  Naohiko Oyasato ,  Shigeru Matake ,  Kei Takano

IPC分类号： G03F7/023 ,  G03F7/038 ,  G03F7/30

CPC分类号： G03F7/0387 ,  G03F7/0233

摘要： Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1## where, R.sup.1 represents a tetravalent organic group, R.sup.2 represents a divalent organic group, and R.sup.3 and R.sup.4 represent a monovalent organic group, at least one of R.sup.3 and R.sup.4 being an organic group having at least on hydroxyl group bonded to an aromatic ring. A semiconductor substrate is coated with the photosensitive resin composition, followed by exposing the coated film to light through a patterning mask and subsequently applying a development and a heat treatment so as to form a polyimide film pattern. A baking treatment also be applied immediately after the exposure step. The photosensitive resin composition of the present invention performs the function of a positive or negative photoresist film and the function of a polyimide protective film on a semiconductor substrate.

摘要翻译： 公开了一种感光性树脂组合物，其含有具有下述通式（1）表示的重复单元的聚酰胺酸衍生物和感光性化合物：其中，R 1表示四价有机基团，R 2表示二价有机基团， R3和R4表示一价有机基团，R3和R4中的至少一个是至少具有与芳环键合的羟基的有机基团。 用感光性树脂组合物涂布半导体基板，然后通过图案化掩模将涂膜曝光，随后进行显影和热处理，以形成聚酰亚胺膜图案。 在曝光步骤之后立即施加烘烤处理。 本发明的感光性树脂组合物在半导体基板上具有正性或负性光致抗蚀剂膜的功能和聚酰亚胺保护膜的功能。