Invention Application
- Patent Title: METHOD FOR THE PRODUCTION OF A SELF-SUPPORTING COPPER FOIL
- Patent Title (English): Method for the production of a self-supporting copper foil
- Patent Title (中): 生产自支撑铜箔的方法
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Application No.: PCT/DE2000/002444Application Date: 2000-07-25
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Publication No.: WO01012880A3Publication Date: 2001-10-04
- Main IPC: C25D1/04
- IPC: C25D1/04 ; C25D3/38 ; H05K1/09 ; H05K3/04 ; C25D5/08
Abstract:
The invention relates to a method for the production of a self-supporting copper foil, which, due to its structure, presents low shear resistance, and can be embossed to have sharp edges. The copper foil is electrodeposited onto a cathode cylinder immersed in an electrolytic copper bath and surrounded by a rotating anode coil. Said copper foil is then detached from the cathode cylinder. A standard electrolytic copper bath is used with such additives as to give the copper foil a laminar-structured dentritic hardness. The laminar extruded structure provides the copper foil thus produced with a reinforced hardness, thus increasing its brittleness. This provides the copper with substantially enhanced contour acuity when embossing is carried out.
Information query