Invention Application
WO2006127037A3 ATMOSPHERIC PRESSURE PROCESSING USING MICROWAVE-GENERATED PLASMAS
审中-公开
使用微波生成等离子体进行大气压力处理
- Patent Title: ATMOSPHERIC PRESSURE PROCESSING USING MICROWAVE-GENERATED PLASMAS
- Patent Title (中): 使用微波生成等离子体进行大气压力处理
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Application No.: PCT/US2005039642Application Date: 2005-11-01
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Publication No.: WO2006127037A3Publication Date: 2009-04-09
- Inventor: KUMAR SATYENDRA , KUMAR DEVENDRA , DOUGHERTY MIKE L , CHERIAN KURUVILLA
- Applicant: DANA CORP , KUMAR SATYENDRA , KUMAR DEVENDRA , DOUGHERTY MIKE L , CHERIAN KURUVILLA
- Assignee: DANA CORP,KUMAR SATYENDRA,KUMAR DEVENDRA,DOUGHERTY MIKE L,CHERIAN KURUVILLA
- Current Assignee: DANA CORP,KUMAR SATYENDRA,KUMAR DEVENDRA,DOUGHERTY MIKE L,CHERIAN KURUVILLA
- Priority: US62523604 2004-11-05; US62543304 2004-11-05; US62550204 2004-11-05
- Main IPC: C23C16/00
- IPC: C23C16/00 ; B23K9/00 ; B23K9/02 ; C21B11/10 ; C21B13/12 ; C21C5/52 ; C21C5/54 ; C22B4/00 ; C23F1/00 ; H01L21/306
Abstract:
An atmospheric plasma processing system is presented. In accordance with embodiments of the present invention, an atmospheric pressure plasma microwave processing apparatus includes a processing area or chamber wherein parts are processed; at least one multi-mode microwave reactor coupled to receive parts for processing; at least one magnetron coupled to at least one multi-mode microwave reactor to provide microwave energy; and a delivery system coupled to at least one multi-mode microwave reactor to deliver the parts into and out of at least one reactor, wherein a plasma can be generated at atmospheric pressure and provided to the parts in at least one multi-mode microwave reactor.
Information query
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