ATMOSPHERIC PRESSURE PROCESSING USING MICROWAVE-GENERATED PLASMAS
    1.
    发明申请
    ATMOSPHERIC PRESSURE PROCESSING USING MICROWAVE-GENERATED PLASMAS 审中-公开
    使用微波生成等离子体进行大气压力处理

    公开(公告)号:WO2006127037A3

    公开(公告)日:2009-04-09

    申请号:PCT/US2005039642

    申请日:2005-11-01

    CPC classification number: B23K1/012 C23C8/38 C23C26/02 H01J37/32192

    Abstract: An atmospheric plasma processing system is presented. In accordance with embodiments of the present invention, an atmospheric pressure plasma microwave processing apparatus includes a processing area or chamber wherein parts are processed; at least one multi-mode microwave reactor coupled to receive parts for processing; at least one magnetron coupled to at least one multi-mode microwave reactor to provide microwave energy; and a delivery system coupled to at least one multi-mode microwave reactor to deliver the parts into and out of at least one reactor, wherein a plasma can be generated at atmospheric pressure and provided to the parts in at least one multi-mode microwave reactor.

    Abstract translation: 提出了一种大气等离子体处理系统。 根据本发明的实施例,大气压等离子体微波处理设备包括处理区域或室,其中处理部件; 耦合以接收用于处理的部件的至少一个多模式微波反应器; 耦合到至少一个多模微波反应器以提供微波能量的至少一个磁控管; 以及耦合到至少一个多模微波反应器以将部件输送到至少一个反应器中的输送系统,其中等离子体可以在大气压下产生并提供给至少一个多模微波反应器中的部件 。

    BIAXIAL LIQUID CRYSTAL ELECTRO-OPTIC DEVICES
    2.
    发明申请
    BIAXIAL LIQUID CRYSTAL ELECTRO-OPTIC DEVICES 审中-公开
    双向液晶电光装置

    公开(公告)号:WO2007025111A1

    公开(公告)日:2007-03-01

    申请号:PCT/US2006/033190

    申请日:2006-08-23

    Inventor: KUMAR, Satyendra

    Abstract: An electro-optical device including a biaxial liquid crystal having a primary and secondary director is provided. A change in orientation of at least one of the directors due to an applied electric field produces a change in the optical state of the device. Response times are increased dramatically over uniaxial nematic based liquid crystal devices, offering improved performance and efficiency.

    Abstract translation: 提供了包括具有初级和次级导向器的双轴液晶的电光装置。 由于施加的电场导致的至少一个导向器的取向的变化产生装置的光学状态的变化。 单轴向列型液晶装置的响应时间显着增加,提高了性能和效率。

    METHODS AND APPARATUS FOR PLASMA PROCESSING CONTROL

    公开(公告)号:WO2003096382A3

    公开(公告)日:2003-11-20

    申请号:PCT/US2003/014135

    申请日:2003-05-07

    Abstract: Apparatus and methods for plasma-process control are provided. One method relates to determining a physical condition of at least one object in a cavity (12) containing gas, where sufficient electromagnetic radiation is directed into the cavity (120) to maintain (e.g., modulate or sustain) a plasma from the gas. The method can further include monitoring a temperature of the at least one object and detecting a spike in the temperature.

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