Invention Application
- Patent Title: APPARATUS FOR THE REMOVAL OF A FLUORINATED POLYMER FROM A SUBSTRATE AND METHODS THEREFOR
- Patent Title (中): 从底物中除去氟化聚合物的装置及其方法
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Application No.: PCT/US2006036139Application Date: 2006-09-15
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Publication No.: WO2007038030B1Publication Date: 2008-01-24
- Inventor: YOON HYUNGSUK ALEXANDER , BOYD JOHN , KUTHI ANDRAS , BAILEY III ANDREW D
- Applicant: LAM RES CORP , YOON HYUNGSUK ALEXANDER , BOYD JOHN , KUTHI ANDRAS , BAILEY III ANDREW D
- Assignee: LAM RES CORP,YOON HYUNGSUK ALEXANDER,BOYD JOHN,KUTHI ANDRAS,BAILEY III ANDREW D
- Current Assignee: LAM RES CORP,YOON HYUNGSUK ALEXANDER,BOYD JOHN,KUTHI ANDRAS,BAILEY III ANDREW D
- Priority: US23747705 2005-09-27
- Main IPC: H01J7/24
- IPC: H01J7/24 ; H01L21/302
Abstract:
An apparatus generating a plasma for removing fluorinated polymer from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the fluorinated polymer.
Public/Granted literature
- WO2007038030A2 APPARATUS FOR THE REMOVAL OF A FLUORINATED POLYMER FROM A SUBSTRATE AND METHODS THEREFOR Public/Granted day:2007-04-05
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