Invention Application
WO2016112326A1 SYSTEM AND METHOD FOR INHIBITING RADIATIVE EMISSION OF A LASER-SUSTAINED PLASMA SOURCE
审中-公开
用于抑制激光持续等离子体源的辐射发射的系统和方法
- Patent Title: SYSTEM AND METHOD FOR INHIBITING RADIATIVE EMISSION OF A LASER-SUSTAINED PLASMA SOURCE
- Patent Title (中): 用于抑制激光持续等离子体源的辐射发射的系统和方法
-
Application No.: PCT/US2016/012707Application Date: 2016-01-08
-
Publication No.: WO2016112326A1Publication Date: 2016-07-14
- Inventor: BEZEL, Ilya , SHCHEMELININ, Anatoly , GROSS, Kenneth P. , SOLARZ, Richard , WILSON, Lauren , YADAV, Rahul , WITTENBERG, Joshua , CHIMMALGI, Anant , LIU, Xiumei , BRUGUIER, Brooke
- Applicant: KLA-TENCOR CORPORATION
- Applicant Address: Legal Department One Technology Drive Milpitas, California 95035 US
- Assignee: KLA-TENCOR CORPORATION
- Current Assignee: KLA-TENCOR CORPORATION
- Current Assignee Address: Legal Department One Technology Drive Milpitas, California 95035 US
- Agency: MCANDREWS, Kevin et al.
- Priority: US62/101,835 20150109; US62/172,373 20150608; US14/989,348 20160106
- Main IPC: H01J65/04
- IPC: H01J65/04
Abstract:
A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element. The gas containment element is configured to contain a volume of a gas mixture. The collector element is configured to focus the pump illumination from the pumping source into the volume of the gas mixture contained within the gas containment element in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas mixture filters one or more selected wavelengths of radiation emitted by the plasma.
Information query