Invention Application
WO2017205198A1 SYSTEM AND METHOD FOR INHIBITING VUV RADIATIVE EMISSION OF A LASER-SUSTAINED PLASMA SOURCE
审中-公开
抑制激光等离子体源的VUV辐射发射的系统和方法
- Patent Title: SYSTEM AND METHOD FOR INHIBITING VUV RADIATIVE EMISSION OF A LASER-SUSTAINED PLASMA SOURCE
- Patent Title (中): 抑制激光等离子体源的VUV辐射发射的系统和方法
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Application No.: PCT/US2017/033485Application Date: 2017-05-19
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Publication No.: WO2017205198A1Publication Date: 2017-11-30
- Inventor: BEZEL, Ilya , GROSS, Kenneth P. , WILSON, Lauren , YADAV, Rahul , WITTENBERG, Joshua , BHUIYAN, Aizaz , SHCHEMELININ, Anatoly , CHIMMALGI, Anant , SOLARZ, Richard
- Applicant: KLA-TENCOR CORPORATION
- Applicant Address: Legal Department One Technology Drive Milpitas, California 95035 US
- Assignee: KLA-TENCOR CORPORATION
- Current Assignee: KLA-TENCOR CORPORATION
- Current Assignee Address: Legal Department One Technology Drive Milpitas, California 95035 US
- Agency: MCANDREWS, Kevin et al.
- Priority: US62/341,532 20160525; US15/223,335 20160729
- Main IPC: H05G2/00
- IPC: H05G2/00 ; H01J65/04
Abstract:
A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element configured to focus the pump illumination from the pumping source into the volume of the gas mixture in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas containment element may be configured to contain a volume of a gas mixture including a first gas component and a second gas component. The second gas component suppresses at least one of a portion of the broadband radiation associated with the first gas component or radiation by one or more excimers associated with the first gas component from a spectrum of radiation exiting the gas mixture.
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