Invention Application
- Patent Title: MOVEABLE EDGE RINGS WITH REDUCED CAPACITANCE VARIATION FOR SUBSTRATE PROCESSING SYSTEMS
-
Application No.: PCT/US2020/044816Application Date: 2020-08-04
-
Publication No.: WO2021026110A1Publication Date: 2021-02-11
- Inventor: KIMBALL, Christopher , MOPIDEVI, Hema Swaroop , SRIRAMAN, Saravanapriyan , KAMP, Tom A. , EHRLICH, Darrell , CONTRERAS, Anthony , MACPHERSON, Chiara Helena Catherina Giammanco
- Applicant: LAM RESEARCH CORPORATION
- Applicant Address: 4650 Cushing Parkway Fremont, California 94538 US
- Assignee: LAM RESEARCH CORPORATION
- Current Assignee: LAM RESEARCH CORPORATION
- Current Assignee Address: 4650 Cushing Parkway Fremont, California 94538 US
- Agency: WIGGINS, Michael D.
- Priority: US62/882,890 20190805; US62/976,088 20200213
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01J37/32 ; H01L21/67 ; H01L21/683 ; H02N13/00
Abstract:
A moveable edge ring system for a plasma processing system includes a top edge ring and a first edge ring arranged below the top edge ring. A second edge ring is made of conductive material and includes an upper portion, a middle portion and a lower portion. The top edge ring and the second edge ring are configured to move in a vertical direction relative to a substrate support and the first edge ring when biased upwardly by a lift pin. The second edge ring is arranged below the top edge ring and radially outside of the first edge ring.
Information query
IPC分类:
