Invention Application
- Patent Title: POSITIVE TONE DEVELOPMENT OF CVD EUV RESIST FILMS
-
Application No.: PCT/US2020/054730Application Date: 2020-10-08
-
Publication No.: WO2021072042A1Publication Date: 2021-04-15
- Inventor: WEIDMAN, Timothy William , NARDI, Katie Lynn , DICTUS, Dries , KAM, Benjamin , WU, Chenghao , HANSEN, Eric Calvin , KENANE, Nizan , GU, Kevin Li
- Applicant: LAM RESEARCH CORPORATION
- Applicant Address: 4650 Cushing Parkway
- Assignee: LAM RESEARCH CORPORATION
- Current Assignee: LAM RESEARCH CORPORATION
- Current Assignee Address: 4650 Cushing Parkway
- Agency: BACA, Helen S. et al.
- Priority: US62/912,330 2019-10-08
- Main IPC: G03F7/16
- IPC: G03F7/16 ; G03F7/20 ; G03F7/004 ; G03F7/32 ; C23C16/56
Abstract:
The present disclosure relates to post-application treatment of a radiation-sensitive film to provide a hardened resist film. In some instances, such films can be used to form a pattern by a positive tone wet development process.
Information query
IPC分类:
