专利检索 ap:("Applied Materials, Inc.") AND inv:"TAEWOONG, Yun" 第 1 页

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发明公开
ENHANCED STRESS TUNING AND INTERFACIAL ADHESION FOR TUNGSTEN (W) GAP FILL 审中-实审

公开(公告)号：EP4377993A1

公开(公告)日：2024-06-05

申请号：EP22850077.3

申请日：2022-07-12

申请人： Applied Materials, Inc.

发明人： CEN, Xi , TAEWOONG, Yun , PETHE, Shirish A. , WU, Kai , SASAKI, Nobuyuki , LEI, Wei

IPC分类号： H01L21/768 , H01L21/285 , H01L23/532

CPC分类号： H01L23/53266 , H01L21/76846 , H01L21/76876 , H01L21/76816