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1.发明公开
公开(公告)号：EP4170071A1
公开(公告)日：2023-04-26
申请号：EP22214580.7
申请日：2018-04-04
摘要： The present invention relates to a method for electrolytically depositing a chromium or chromium alloy layer on at least one substrate, the method comprising the steps
(a) providing an aqueous deposition bath with a pH in the range from 4.1 to 7.0,
- comprising trivalent chromium ions,
- comprising 0 mg/L to 200 mg/L hexavalent chromium, based on the total volume of the deposition bath, and
- not comprising boron containing compounds,
(b) providing the at least one substrate and at least one anode,
(c) immersing the at least one substrate in the aqueous deposition bath and applying an electrical direct current such that the chromium or chromium alloy layer is deposited on the at least one substrate, wherein
the at least one substrate forms the cathode having a total cathodic current density and the at least one anode having a total anodic current density,
with the proviso that
- the total anodic current density is 6 A/dm 2 or more,
- the total cathodic current density is 18 A/dm 2 or more,
- the at least one substrate and the at least one anode are present in the deposition bath such that the trivalent chromium ions are in contact with the at least one anode.-
2.发明公开
公开(公告)号：EP4071280A1
公开(公告)日：2022-10-12
申请号：EP22173932.9
申请日：2018-04-04
摘要： The present invention refers to a controlled method for depositing a chromium or chromium alloy layer on at least one substrate, the method comprising the steps
(a) providing an aqueous deposition bath, wherein
the bath comprises
- trivalent chromium ions,
- bromide ions,
- alkali metal cations in a total amount of 0 mol/L to 1 mol/L, based on the total volume of the deposition bath, and
the bath has
- a target pH within the range from 4.1 to 7.0,
(b) providing the at least one substrate and at least one anode,
(c) immersing the at least one substrate in the aqueous deposition bath and applying an electrical direct current such that the chromium or chromium alloy layer is deposited on the substrate, the substrate being the cathode, wherein during or after step (c) the pH of the deposition bath is lower than the target pH,
(d) adding NH 4 OH and/or NH 3 during or after step (c) to the deposition bath such that the target pH of the deposition bath is recovered.-
3.发明公开
公开(公告)号：EP4101947A1
公开(公告)日：2022-12-14
申请号：EP21178841.9
申请日：2021-06-10
摘要： The present invention relates to a method for electrodepositing a dark chromium layer on a substrate, a respective electroplating bath for depositing such a dark chromium layer, and a respective substrate comprising said dark chromium layer. The electroplating bath comprises colloidal particles containing the chemical element aluminum. The substrate comprising said dark chromium layer is primarily suited for decorative purposes.
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4.发明公开
公开(公告)号：EP4083268A1
公开(公告)日：2022-11-02
申请号：EP21171655.0
申请日：2021-04-30
摘要： The present invention refers to an electroplating composition for depositing a chromium or chromium alloy layer on a substrate, said composition comprising (i) trivalent chromium ions, (ii) at least one complexing agent for the trivalent chromium ions, and (iii) at least one kind of oxide-hydroxide particles; a method for depositing a respective chromium and chromium alloy layer; a respective use of said particles; and respective substrates comprising such a chromium or chromium alloy layer.
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