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1.发明公开
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2.发明公开
公开(公告)号：EP3683822A2
公开(公告)日：2020-07-22
申请号：EP20152894.0
申请日：2020-01-21
申请人： Carl Zeiss SMT GmbH
发明人： BUDACH, Michael , AUTH, Nicole
摘要： The present application relates to an apparatus (200) for determining a position of at least one element (130, 540, 940) on a photolithographic mask (110), said apparatus comprising: (a) at least one scanning particle microscope (210) comprising a first reference object (240), wherein the first reference object (240) is disposed on the scanning particle microscope (210) in such a way that the scanning particle microscope (210) can be used to determine a relative position of the at least one element (130, 540, 940) on the photolithographic mask (110) relative to the first reference object (240); and (b) at least one distance measuring device (270), which is embodied to determine a distance between the first reference object (240) and a second reference object (250), wherein there is a relationship between the second reference object (250) and the photolithographic mask (110).
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3.发明授权VERFAHREN ZUM ERMITTELN EINER REPARATURFORM EINES DEFEKTS AN ODER IN DER NÄHE EINER KANTE EINES MUSTERS EINER PHOTOMASKE 有权VERFAHREN ZUM ERMITTELN EINER REPARATURFORM EINES DEFEKTS AND DOD IN DERNÄHEEINER KANTE EINES MUSTERS EINER PHOTOMASKE
公开(公告)号：EP2368152B1
公开(公告)日：2017-08-16
申请号：EP09778702.2
申请日：2009-09-24
申请人： Carl Zeiss SMT GmbH
发明人： BUDACH, Michael
CPC分类号： G03F1/74 , G01Q30/06 , G01Q80/00 , G03F1/84 , H01J2237/2817 , Y10T29/49718
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4.发明公开
公开(公告)号：EP4377492A1
公开(公告)日：2024-06-05
申请号：EP21754956.7
申请日：2021-07-30
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F1/72 , G03F1/24 , C23C16/405 , C23C16/047 , C23C16/487
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公开(公告)号：EP4339992A1
公开(公告)日：2024-03-20
申请号：EP23196850.4
申请日：2023-09-12
申请人： Carl Zeiss SMT GmbH
摘要： The present application relates to a method for characterizing a shielding element (C) of a particle beam device (100) for shielding an electric field between a sample position and a particle beam source (101). The method comprises positioning a means for characterizing (S1, S2, S3) the shielding element on a side of the shielding element which is facing the sample position.
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6.发明公开
公开(公告)号：EP3683822A3
公开(公告)日：2020-10-21
申请号：EP20152894.0
申请日：2020-01-21
申请人： Carl Zeiss SMT GmbH
发明人： BUDACH, Michael , AUTH, Nicole
摘要： The present application relates to an apparatus (200) for determining a position of at least one element (130, 540, 940) on a photolithographic mask (110), said apparatus comprising: (a) at least one scanning particle microscope (210) comprising a first reference object (240), wherein the first reference object (240) is disposed on the scanning particle microscope (210) in such a way that the scanning particle microscope (210) can be used to determine a relative position of the at least one element (130, 540, 940) on the photolithographic mask (110) relative to the first reference object (240); and (b) at least one distance measuring device (270), which is embodied to determine a distance between the first reference object (240) and a second reference object (250), wherein there is a relationship between the second reference object (250) and the photolithographic mask (110).
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公开(公告)号：EP2715767B1
公开(公告)日：2019-05-08
申请号：EP12725622.0
申请日：2012-05-25
申请人： Carl Zeiss SMT GmbH
IPC分类号： H01J37/28 , H01J37/244 , H01J37/304 , G01Q10/00
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公开(公告)号：EP4214734A2
公开(公告)日：2023-07-26
申请号：EP21777735.8
申请日：2021-09-15
申请人： Carl Zeiss SMT GmbH
发明人： AUTH, Nicole , BUDACH, Michael , HOFMANN, Thorsten , OSTER, Jens
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9.发明公开
公开(公告)号：EP4148498A3
公开(公告)日：2023-06-07
申请号：EP22191527.5
申请日：2022-08-22
申请人： Carl Zeiss SMT GmbH
发明人： HOFMANN, Thorsten , BUDACH, Michael
IPC分类号： G03F1/74
摘要： Method for particle beam-induced processing of a defect (D, D') of a microlithographic photomask (100), including the steps of:
a1) providing (S1) an image (300) of at least a portion of the photomask (100),
b1) determining (S2) a geometric shape of a defect (D, D') in the image (300) as a repair shape (302, 302'),
c1) subdividing (S3) the repair shape (302, 302') into a number of n pixels (304) in accordance with a first rasterization (306),
d1) subdividing (S5) the repair shape into a number of m pixels (304') in accordance with a second rasterization (306'), the second rasterization (306') emerging from a subpixel displacement of the first rasterization (306),
e1) providing (S4) an activating particle beam (202) and a process gas at each of the n pixels (304) of the repair shape (302, 302') in accordance with the first rasterization (306), and
f1) providing (S6) the activating particle beam (202) and the process gas at each of the m pixels (304') of the repair shape (302, 302') in accordance with the second rasterization (306').-
10.发明公开
公开(公告)号：EP4148498A2
公开(公告)日：2023-03-15
申请号：EP22191527.5
申请日：2022-08-22
申请人： Carl Zeiss SMT GmbH
发明人： HOFMANN, Thorsten , BUDACH, Michael
IPC分类号： G03F1/74
摘要： Method for particle beam-induced processing of a defect (D, D') of a microlithographic photomask (100), including the steps of:
a1) providing (S1) an image (300) of at least a portion of the photomask (100),
b1) determining (S2) a geometric shape of a defect (D, D') in the image (300) as a repair shape (302, 302'),
c1) subdividing (S3) the repair shape (302, 302') into a number of n pixels (304) in accordance with a first rasterization (306),
d1) subdividing (S5) the repair shape into a number of m pixels (304') in accordance with a second rasterization (306'), the second rasterization (306') emerging from a subpixel displacement of the first rasterization (306),
e1) providing (S4) an activating particle beam (202) and a process gas at each of the n pixels (304) of the repair shape (302, 302') in accordance with the first rasterization (306), and
f1) providing (S6) the activating particle beam (202) and the process gas at each of the m pixels (304') of the repair shape (302, 302') in accordance with the second rasterization (306').
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