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公开(公告)号：EP1774563A1
公开(公告)日：2007-04-18
申请号：EP05763473.5
申请日：2005-06-30
IPC分类号： H01J37/34
CPC分类号： H01J37/3455 , H01J37/3405 , H01J37/3423 , H01J37/3497
摘要： In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, mean for rotating the target about its axis during a sputtering operation, an elongated magnet carried within the target for generation of a plasma-containing magnetic field exterior to but adjacent the target, a framework for supporting the magnet against rotation within the target, and a power train for causing the magnet to oscillate within and axially of the target in a substantially asynchronous manner to promote generally uniform target utilization along its length, as well as its method of use. In some embodiments, the magnet is oscillated in response to rotation of the target.
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公开(公告)号：EP1390964B1
公开(公告)日：2011-12-07
申请号：EP02723835.1
申请日：2002-04-10
申请人： General Plasma, Inc.
发明人： MADOCKS, John, E.
CPC分类号： H01J27/14 , C23C16/50 , C23C16/505 , C23C16/545 , H01J37/32623 , H01J37/3266 , H01J37/3277 , H05H1/14
摘要： A dipole ion source (Figure 1) includes two cathode surfaces, a substrate (1) and a pole (3); wherein a gap is defined between the substrate and the pole; an unsymmetrical mirror magnetic field including a compressed end, wherein the substrate is positioned in the less compressed end of the magnetic field; and an anode (4) creating an electric field penetrating the magnetic field and confining electrons in a continuous Hall current loop, wherein the unsymmetrical magnetic field serves an ion beam on the substrate.
摘要翻译： 偶极子离子源（图1）包括两个阴极表面，一个衬底（1）和一个极（3）; 其中在所述基板和所述极之间限定间隙; 包括压缩端的非对称镜像磁场，其中所述衬底位于所述磁场的较小压缩端中; 和产生穿透磁场并将电子限制在连续霍尔电流回路中的电场的阳极（4），其中非对称磁场用于衬底上的离子束。
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公开(公告)号：EP3286477B1
公开(公告)日：2020-01-29
申请号：EP16719739.1
申请日：2016-04-25
申请人： General Plasma Inc.
发明人： MADOCKS, John, E.
IPC分类号： F16L37/23
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公开(公告)号：EP1388159B1
公开(公告)日：2011-12-07
申请号：EP02723836.9
申请日：2002-04-10
申请人： General Plasma, Inc.
发明人： MADOCKS, John, E.
CPC分类号： H01J27/14 , C23C16/50 , C23C16/505 , C23C16/545 , H01J37/32623 , H01J37/3266 , H01J37/3277 , H05H1/14
摘要： The preferred embodiments described herein provide a magnetic mirror plasma source. While the traditional magnetic/electrostatic confinement method is ideal for many applications, some processes are not best served with this arrangement. The preferred embodiments described herein present a new technique to confine electrons (3) to produce a low pressure, dense plasma directly on a substrate surface (75). With these preferred embodiments, a combination of electrostatic and mirror magnetic confinement is implemented. The result is a novel plasma source that has unique and important advantages enabling advancements in PECVD, etching, and plasma treatment processes.
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公开(公告)号：EP1390558B1
公开(公告)日：2011-01-19
申请号：EP02764187.7
申请日：2002-04-10
申请人： General Plasma, Inc.
发明人： MADOCKS, John, E.
CPC分类号： H01J27/14 , C23C16/50 , C23C16/505 , C23C16/545 , H01J37/32623 , H01J37/3266 , H01J37/3277 , H05H1/14
摘要： The preferred embodiments described herein provide a Penning discharge plasma source. The magnetic and electric field arrangement, similar to a Penning discharge, effectively traps the electron Hall current in a region between two surfaces. When a substrate (10) is positioned proximal to at least one of the electrodes (11, 12) and is moved relative to the plasma, the substrate (10) is plasma treated, coated or otherwise modified depending upon the process gas used and the process pressure. This confinement arrangement produces dramatic results not resembling known prior art. Using this new source, many applications for PECVD, plasma etching, plasma treating, sputtering or other plasma processes will be substantial improved or made possible. In particular, applications using flexible webs (10) are benefited.
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