Photosensitive composition and pattern forming process using same
    7.
    发明公开
    Photosensitive composition and pattern forming process using same 失效
    Lichtempfindliche Zusammensetzung und Verfahren zur Herstellung von Bildstrukturen damit。

    公开(公告)号:EP0043716A2

    公开(公告)日:1982-01-13

    申请号:EP81303053.3

    申请日:1981-07-03

    申请人: Hitachi, Ltd.

    IPC分类号: G03F7/08 G03C5/00

    CPC分类号: G03F7/0166

    摘要: The sensitivity of a photosensitive composition based on an aromatic diazonium salt which gets sticky upon exposure to light, is improved by adding a salt of a compound of the general formula:
    wherein R 1 and R 2 each represents a straight chain alkyl group, and X, Y and Z each represents H, a straight chain alkyl group or an alkoxy group, but two or more of X, Y and Z cannot be H at the same time. Such compositions are used to form a pattern of powder coat layer on a substrate, e.g. a colour television picture tube.

    摘要翻译: 通过加入通式为...的化合物的盐,改善了基于曝光时粘稠的芳族重氮盐的光敏组合物的敏感性,其中R 1和R 2各自表示直链烷基 X,Y和Z各自表示H,直链烷基或烷氧基,但X,Y和Z中的两个以上不能同时为H。 这样的组合物用于在基底上形成粉末涂层的图案,例如, 彩色电视显像管。

    Method of forming a pattern employing a photosensitive composition
    10.
    发明公开
    Method of forming a pattern employing a photosensitive composition 失效
    一种用于生产使用感光性组合物的图案的方法。

    公开(公告)号:EP0042704A2

    公开(公告)日:1981-12-30

    申请号:EP81302620.0

    申请日:1981-06-12

    申请人: Hitachi, Ltd.

    IPC分类号: G03C1/54 H01J29/22

    摘要: photosensitive composition for use in forming color picture tubes contains an aromatic diazonium compound of the general formula:
    where R 1 and R 2 are straight chain alkyl radicals, R 3 and R 4 are each one of H, CH 3 or OCH 3 except that R 3 and R 4 cannot both be H, and A is CL½ZnCl 2 , BF 4 or HSO 4 . The sensitivity of the composition is approximately 10 - 20% higher than that of conventional compositions.

    摘要翻译: 在形成彩色显象管中使用的光敏组合物含有在通式芳香族重氮化合物:其中R1和R2是直链的烷基,R3和R4是除H,CH 3或OCH 3中的每一个做R3和R4 既不能为H,且A为CL.1 / 2ZnCl2,BF 4或HSO 4。 该组合物的灵敏度为约10 - 比常规组合物的高20%。