摘要:
A semiconductor device including a fuse-type memory element is disclosed. This device comprises a semi-conductor substrate, a field insulating layer on the substrate in which a hollow or trench is formed, and a fuse formed on the field insulating layer so as to run across the hollow or trench. The fuse is broken down on the edge of the hollow so that the broken point of the fuse may be predetermined.
摘要:
@ The non-volatile semiconductor memory elements having an MIS structure show a hysteresis curve in the gate voltage - the threshold voltage characteristic. The continuously changing region of the hysteresis curve is used to operate the memory elements as analog memories. The input analog signal is applied to the gate electrode of a selected memory element after it is converted to have a voltage-within the continuously changing region, to change the threshold voltage of the selected memory element. The changed threshold voltage is read out in read-out operation.
摘要:
A semiconductor device including a fuse-type memory element is disclosed. This device comprises a semi-conductor substrate, a field insulating layer on the substrate in which a hollow or trench is formed, and a fuse formed on the field insulating layer so as to run across the hollow or trench. The fuse is broken down on the edge of the hollow so that the broken point of the fuse may be predetermined.
摘要:
@ The non-volatile semiconductor memory elements having an MIS structure show a hysteresis curve in the gate voltage - the threshold voltage characteristic. The continuously changing region of the hysteresis curve is used to operate the memory elements as analog memories. The input analog signal is applied to the gate electrode of a selected memory element after it is converted to have a voltage-within the continuously changing region, to change the threshold voltage of the selected memory element. The changed threshold voltage is read out in read-out operation.