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    Positive type photoresist composition
    1.
    发明公开
    Positive type photoresist composition 失效
    阳光照射光。

    公开(公告)号：EP0471326A1

    公开(公告)日：1992-02-19

    申请号：EP91113522.6

    申请日：1991-08-12

    申请人： NIPPON OIL COMPANY, LIMITED

    发明人： Yoda, Eiji ,  Sato, Haruyoshi, Nisseki Kagaku Shataku ,  Yamasita, Yukio ,  Yuasa, Hitoshi ,  Otsuki, Yutaka

    IPC分类号： G03F7/039 ,  G03F7/023

    CPC分类号： G03F7/0233

    摘要： A positive type photoresist composition contains (a) 100 parts by weight of a resin which is a polymer compound (A) including carbon-carbon double bonds and having a molecular weight of 300 to 30,000 and an iodine value of 50 to 500. To at least a part of the double bonds of the polymer compound (A), a group represented by the formula (I) is introduced

    wherein R¹ denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and R² denotes an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or an aryl group. The composition further contains (b) 25 to 100 parts by weight of a compound containing a quinone diazide unit.

    摘要翻译： 正型光致抗蚀剂组合物含有（a）100重量份作为包含碳 - 碳双键并且分子量为300〜30,000，碘值为50〜500的高分子化合物（A）的树脂。 引入高分子化合物（A）的双键的至少一部分，由式（I）表示的基团，其中R 1表示氢原子，卤素原子或具有1〜3个碳原子的烷基 碳原子，R 2表示碳原子数1〜10的烷基，环烷基或芳基。 该组合物还含有（b）25〜100重量份的含有醌二叠氮单元的化合物。