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1.发明公开METHOD OF RECOVERING VALUABLE METAL FROM SCRAP CONTAINING CONDUCTIVE OXIDE 有权VERFAHREN ZURRÜCKGEWINNUNGVON WERTMETALL AUS ALTMETALL MITLEITFÄHIGEMOXID
公开(公告)号：EP2130947A1
公开(公告)日：2009-12-09
申请号：EP08721548.9
申请日：2008-03-07
发明人： SHINDO, Yuichiro , TAKEMOTO, Koichi
IPC分类号： C25C1/14 , C22B1/02 , C22B3/04 , C22B3/44 , C22B5/12 , C22B7/00 , C22B19/34 , C22B25/06 , C22B58/00 , C25B1/00 , C25C1/16 , C25C1/22
CPC分类号： C22B3/045 , C22B3/44 , C22B7/006 , C22B25/04 , C22B25/06 , C22B58/00 , C25B1/04 , C25C1/14 , Y02E60/366 , Y02P10/228 , Y02P10/234
摘要： Provided is a method of recovering valuable metal from oxide system scrap including the steps of performing electrolysis using an insoluble electrode as an anode and an oxide system scrap as a cathode, and recovering the scrap of the cathode as metal or suboxide. Specifically, this method enables the efficient recovery of valuable metal from oxide system scrap of an indium-tin oxide (ITO) sputtering target or oxide system scrap such as mill ends that arise during the production of such a sputtering target.
摘要翻译： 本发明提供从氧化物系废料中回收贵重金属的方法，包括使用不溶性电极作为阳极和氧化物系废料作为阴极进行电解，并将阴极的废料回收为金属或低氧化物的步骤。 具体地说，该方法能够有效地回收氧化铟锡（ITO）溅射靶的氧化物系废料，或者在制造这样的溅射靶时产生的氧化物系废料例如轧制端。
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2.发明公开PROCESS FOR RECOVERY OF VALUABLE METALS FROM SCRAP IZO 审中-公开回收 - Verfahren von wertvollen Metallen aus Izo-Schrott
公开(公告)号：EP2248930A1
公开(公告)日：2010-11-10
申请号：EP08873155.9
申请日：2008-12-09
摘要： Provided is a method of recovering valuable metals from IZO scrap in which valuable metals are recovered as indium and zinc metals or suboxides by performing electrolysis using an insoluble electrode as an anode and an IZO scrap as a cathode. Specifically, this method enables the efficient recovery of indium and zinc from IZO scrap such as an indium-zinc oxide (IZO) sputtering target or IZO mill ends that arise during the manufacture of such a sputtering target.
摘要翻译： 提供从IZO废料中回收贵重金属的方法，其中通过使用不溶性电极作为阳极和IZO废料作为阴极进行电解，将贵金属作为铟和锌金属或低氧化物回收。 具体地说，该方法能够在制造这样的溅射靶的过程中产生的诸如铟 - 氧化锌（IZO）溅射靶或IZO研磨端的IZO废料有效地回收铟和锌。
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公开(公告)号：EP2078767A1
公开(公告)日：2009-07-15
申请号：EP07767700.3
申请日：2007-06-27
IPC分类号： C25C1/14
CPC分类号： C25C1/14 , C22B3/045 , C22B7/006 , C22B25/06 , C22B58/00 , Y02P10/228 , Y02P10/234
摘要： Proposed is a method for collecting valuable metal from an ITO scrap including a step of collecting tin by subjecting the ITO scrap to electrolysis. Further proposed is a method for collecting valuable metal from an ITO scrap including the steps of providing an ITO electrolytic bath and a tin collecting bath, dissolving the ITO scrap in the electrolytic bath, and thereafter collecting tin in the tin collecting bath. Additionally proposed is a method for collecting valuable metal from an ITO scrap including the steps of dissolving the ITO scrap by subjecting it to electrolysis as an anode in electrolyte, precipitating only tin contained in the solution as tin itself or a substance containing tin, extracting the precipitate, placing it in a collecting bath, re-dissolving this to obtain a solution of tin hydroxide, and performing electrolysis or neutralization thereto in order to collect tin. Consequently, provided is a method for efficiently collecting tin from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arising during the manufacture of such ITO sputtering target.
摘要翻译： 提出了一种从ITO废料中回收有价金属的方法，包括通过对ITO废料进行电解来回收锡的步骤。 还提出了从ITO废料中回收有价金属的方法，包括提供ITO电解槽和锡收集槽，将ITO废料溶解在电解槽中，然后将锡收集在锡收集槽中的步骤。 另外提出了一种从ITO废料中回收有价金属的方法，包括以下步骤：通过将ITO废料作为电解液作为阳极溶解在电解质中，仅沉淀溶液中含有的锡作为锡本身或含锡的物质， 沉淀，将其置于收集槽中，将其重新溶解以获得氢氧化锡溶液，并对其进行电解或中和以收集锡。 因此，提供了一种用于从ITO铟锡氧（ITO）溅射靶的ITO废料或ITO废料（例如在制造这种ITO溅射靶期间产生的ITO碾磨端）有效地收集锡的方法。
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公开(公告)号：EP2241655A1
公开(公告)日：2010-10-20
申请号：EP09710064.8
申请日：2009-01-30
IPC分类号： C25C1/22 , C01G9/02 , C01G15/00 , C22B3/44 , C22B7/00 , C22B19/20 , C22B19/30 , C22B58/00 , C25C1/16
CPC分类号： C22B3/045 , C01G9/02 , C01G15/00 , C22B3/22 , C22B7/006 , C22B19/30 , C22B58/00 , C25B1/00 , C25C1/22 , Y02P10/234
摘要： Provided are a method of recovering valuable metals from IZO scrap, wherein indium and zinc are recovered as hydroxides by using an IZO scrap as both an anode and a cathode, and performing electrolysis while periodically reversing polarity; and a method of recovering valuable metals from IZO scrap, wherein the hydroxides of indium and zinc obtained by the electrolysis are roasted and indium and zinc are recovered as oxides. Specifically, provided is a method which enables the efficient recovery of indium and zinc from IZO scrap such as a spent indium-zinc oxide (IZO) sputtering target and IZO mill ends arising during the manufacture of such a sputtering target.
摘要翻译： 本发明提供一种从IZO废料中回收有价金属的方法，其中通过使用IZO废料作为阳极和阴极并且在周期性地反转极性的同时进行电解来回收铟和锌作为氢氧化物; 以及从IZO废料中回收有价金属的方法，其中通过电解得到的铟和锌的氢氧化物被焙烧并且铟和锌作为氧化物被回收。 具体而言，提供一种能够从制造这种溅射靶时产生的IZO废料如废铟锌氧化物（IZO）溅射靶和IZO研磨末端有效回收铟和锌的方法。
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5.发明公开High purity hafnium, high purity hafnium target and method of manufacturing a thin film using high purity hafnium 有权高纯度铪，以及高纯度Hafniumtarget方法用于通过使用高纯度的制造薄膜Hafnuims
公开(公告)号：EP2017360A3
公开(公告)日：2009-08-05
申请号：EP08165172.1
申请日：2004-10-25
发明人： SHINDO, Yuichiro
IPC分类号： C22B34/14
CPC分类号： C22C27/00 , C22B34/14 , C23C14/3414
摘要： The present invention relates to high purity hafnium having a purity of 4N or higher excluding zirconium and gas components and an oxygen content of 40wtppm or less, and a target and thin film formed from such high purity hafnium, and high purity hafnium having a purity of 4N or higher excluding zirconium and gas components and in which the content of sulfur and phosphorus is respectively 10wtppm or less. The present invention also relates to a high purity hafnium material which uses a hafnium sponge with reduced zirconium as the raw material, and in which the content of oxygen, sulfur and phosphorus containing in the hafnium is reduced, as well as to a target and thin film formed from such material, and to the manufacturing method of high purity hafnium. Thereby provided is efficient and stable manufacturing technology which enables the manufacture of a high purity hafnium material, and a target and thin film formed from such material.
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公开(公告)号：EP2078766A1
公开(公告)日：2009-07-15
申请号：EP07767698.9
申请日：2007-06-27
CPC分类号： C25C1/00 , C22B3/045 , C22B7/006 , C22B25/06 , C22B58/00 , Y02P10/228 , Y02P10/234
摘要： Proposed is a method for collecting valuable metal from an ITO scrap in which a mixture of indium hydroxide and tin hydroxide or metastannic acid is collected by subjecting the ITO scrap to electrolysis in pH-adjusted electrolyte, and roasting this mixture as needed to collect the result as a mixture of indium oxide and tin oxide. This method enables the efficient collection of indium hydroxide and tin hydroxide or metastannic acid, or indium oxide and tin oxide from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.
摘要翻译： 提出了一种从ITO废料中回收有价值金属的方法，其中通过在pH调节电解液中对ITO废料进行电解来收集氢氧化铟和氢氧化锡或偏锡酸的混合物，并根据需要焙烧该混合物以收集结果 作为氧化铟和氧化锡的混合物。 该方法能够有效地从ITO铟锡氧化物（ITO）溅射靶的ITO废料或ITO废料（例如ITO搪瓷末端）在制造期间收集氢氧化铟和氢氧化锡或偏锡酸或氧化铟和氧化锡末端 的这种ITO溅射靶。
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公开(公告)号：EP2065488A1
公开(公告)日：2009-06-03
申请号：EP07767699.7
申请日：2007-06-27
CPC分类号： C25C1/00 , C22B3/045 , C22B3/44 , C22B7/006 , C22B25/06 , C22B58/00 , C25C1/14 , C25C1/22 , Y02P10/228 , Y02P10/234
摘要： Proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis in pH-adjusted electrolyte, and collecting indium or tin as oxides. Additionally proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis in an electrolytic bath partitioned with a diaphragm or an ion-exchange membrane to precipitate hydroxide of tin, thereafter extracting anolyte temporarily, and precipitating and collecting indium contained in the anolyte as hydroxide. With the methods for collecting valuable metal from an ITO scrap described above, indium or tin may be collected as oxides by roasting the precipitate containing indium or tin. Consequently, provided is a method for efficiently collecting indium from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.
摘要翻译： 提出了一种从ITO废料中回收有价金属的方法，包括使ITO废料在经pH调节的电解液中电解并收集铟或锡作为氧化物的步骤。 另外提出了一种从ITO废料中回收有价金属的方法，包括在隔膜或离子交换膜分隔的电解槽中使ITO废料进行电解以沉淀锡的氢氧化物，然后暂时提取阳极电解液并沉淀 并将阳极电解液中所含的铟作为氢氧化物进行收集。 利用上述从ITO废料中收集有价金属的方法，通过焙烧含有铟或锡的沉淀物可将铟或锡作为氧化物收集。 因此，提供了一种用于在制造这种ITO溅射靶时从铟锡氧化物（ITO）溅射靶的ITO废料或诸如ITO碾磨末端的ITO废料中有效地收集铟的方法。
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公开(公告)号：EP2063000A1
公开(公告)日：2009-05-27
申请号：EP07767701.1
申请日：2007-06-27
IPC分类号： C25C1/24
CPC分类号： C25C1/24 , C22B3/045 , C22B7/006 , C22B25/06 , C22B58/00 , Y02P10/228 , Y02P10/234
摘要： Proposed is a method for collecting valuable metal from an ITO scrap including the steps of subjecting the ITO scrap to electrolysis and collecting the result as indium-tin alloy. Additionally provided is a method for collecting valuable metal from an ITO scrap including the steps of providing an ITO electrolytic bath and an indium-tin alloy collecting bath, dissolving the ITO in the electrolytic bath, and thereafter collecting indium-tin alloy in the indium-tin alloy collecting bath. These methods enable the efficient collection of indium-tin alloy from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.
摘要翻译： 提出了一种从ITO废料中回收有价金属的方法，包括将ITO废料进行电解并收集结果作为铟锡合金的步骤。 还提供一种从ITO废料中回收有价金属的方法，包括提供ITO电解槽和铟锡合金收集槽，将ITO溶解在电解槽中，然后将铟锡合金收集在铟锡合金中， 锡合金收集槽。 这些方法能够在制造这种ITO溅射靶期间从铟锡氧化物（ITO）溅射靶的ITO废料或ITO废料（例如ITO碾磨末端）有效收集铟锡合金。
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9.发明公开METHOD OF RECOVERING VALUABLE METALS FROM IZO SCRAP 有权回收 - VERFAHREN VON WERTVOLLEN METALLEN AUS IZO-SCHROTT
公开(公告)号：EP2241656A1
公开(公告)日：2010-10-20
申请号：EP09710686.8
申请日：2009-01-30
CPC分类号： C22B58/00 , C01G9/02 , C01G15/00 , C22B3/045 , C22B3/22 , C22B7/006 , C22B19/30 , C25B1/00 , C25C1/22 , Y02P10/234
摘要： Provided are a method of recovering valuable metals from IZO scrap, wherein valuable metals are recovered as hydroxides of indium and zinc by using an insoluble electrode as an anode or a cathode and an IZO scrap as the other cathode or anode as the opposite electrode, and performing electrolysis while periodically reversing polarity; and a method of recovering valuable metals from IZO scrap, wherein the hydroxides of indium and zinc obtained by the electrolysis are roasted and valuable metals are recovered as oxides of indium and zinc. Specifically, provided is a method which enables the efficient recovery of indium and zinc from IZO scrap such as a spent indium-zinc oxide (IZO) sputtering target and IZO mill ends arising during the manufacture of such a sputtering target.
摘要翻译： 提供了从IZO废料中回收贵重金属的方法，其中通过使用不溶性电极作为阳极或阴极以及作为另一阴极或阳极的IZO废料作为相对电极，有价金属作为铟和锌的氢氧化物回收，以及 在周期性地反转极性的同时执行电解; 以及从IZO废料中回收有价金属的方法，其中通过电解获得的铟和锌的氢氧化物被焙烧，有价金属作为铟和锌的氧化物回收。 具体地说，提供了一种能够在制造这样的溅射靶的过程中产生的诸如废铟 - 氧化锌（IZO）溅射靶和IZO研磨端的IZO废料有效地回收铟和锌的方法。
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10.发明公开HIGHLY PURE LANTHANUM, SPUTTERING TARGET COMPRISING HIGHLY PURE LANTHANUM, AND METAL GATE FILM MAINLY COMPOSED OF HIGHLY PURE LANTHANUM 审中-公开高纯度镧，用高纯镧，主要通过高纯氧化镧现有金属栅膜溅射靶
公开(公告)号：EP2224024A1
公开(公告)日：2010-09-01
申请号：EP08866745.6
申请日：2008-10-31
IPC分类号： C22B59/00 , C22B9/22 , C22C28/00 , C23C14/34 , H01L21/283 , H01L21/285 , H01L29/423 , H01L29/49 , H01L29/78
CPC分类号： C22C28/00 , C22B9/228 , C22B59/00 , C23C14/3414 , H01L21/28079 , H01L21/2855 , H01L29/495
摘要： Provided are high-purity lanthanum, wherein the purity excluding rare-earth elements and gas components is 4N or higher, and amounts of aluminum, iron and copper in the lanthanum are respectively 100wtppm or less; as well as high-purity lanthanum, wherein the purity excluding rare-earth elements and gas components is 4N or higher, amounts of aluminum, iron and copper in the lanthanum are respectively 100wtppm or less, oxygen content is 1500wtppm or less, elements of alkali metals and alkali earth metals are respectively 1wtppm or less, elements of transition metals and high-melting-point metals other than those above are respectively 10wtppm or less, and radioactive elements are respectively 10wtppb or less. The invention aims to provide technology capable of efficiently and stably providing high-purity lanthanum, a sputtering target comprising high-purity lanthanum, and a thin film for metal gate mainly comprising high-purity lanthanum.
摘要翻译： 提供的是高纯度镧，worin不含稀土元素和气体成分以外的纯度为4N以上，镧中的铝，铁和铜的量分别为100重量ppm以下; 以及高纯度镧，worin不含稀土元素和气体成分以外的纯度为4N以上，镧中的铝，铁和铜的量分别为100重量ppm以下，氧含量为1500重量ppm以下，的碱金属元素 金属和碱土金属是分别为1重量ppm以下，过渡金属和除上述那些其他的高融点金属的各元素分别为10重量ppm以下，放射性元素分别为10重量ppb以下。 本发明目的在于提供能够有效且稳定地提供高纯度镧，溅射靶，含有高纯度镧，和薄膜为金属栅主要包含高纯度镧的技术。
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