摘要:
Transistors, and methods of manufacturing the transistors, include graphene and a material converted from graphene. The transistor may include a channel layer including graphene and a gate insulating layer including a material converted from graphene. The material converted from the graphene may be fluorinated graphene. The channel layer may include a patterned graphene region. The patterned graphene region may be defined by a region converted from graphene. A gate of the transistor may include graphene.
摘要:
Transistors and methods of manufacturing the same may include a gate (G1) on a substrate, a graphene channel layer (C1) having a three-dimensional (3D) channel region covering at least a portion of a gate, a source electrode (S1) contacting a first region of the channel layer, and a drain electrode (D1) contacting a second region of the channel layer.
摘要:
Transistors and methods of manufacturing the same may include a gate (G1) on a substrate, a graphene channel layer (C1) having a three-dimensional (3D) channel region covering at least a portion of a gate, a source electrode (S1) contacting a first region of the channel layer, and a drain electrode (D1) contacting a second region of the channel layer.
摘要:
A terahertz radiation source includes: a cathode configured to emit an electron beam, an anode configured to focus the electron beam emitted from the cathode; a collector facing the cathode and configured to collect the emitted electron beam focused by the anode; an oscillating circuit positioned between the anode and the collector and configured to convert energy of a passing electron beam into electromagnetic wave energy; and an output unit connected to the oscillating circuit and configured to externally emit the electromagnetic wave energy.
摘要:
A graphene electronic device includes: a first conductive layer (12) and a semiconductor layer (13) on a first region of an intermediate layer (11); a second conductive layer (14) on a second region of the intermediate layer; a graphene layer (15) on the intermediate layer, the semiconductor layer, and the second conductive layer; and a first gate structure (17) and a second gate structure (18) on the graphene layer.
摘要:
A method of manufacturing a graphene device may include forming a device portion including a graphene layer (GP1) on the first substrate (SUB1); attaching a second substrate (SUB2) on the device portion of the first substrate; and removing the first substrate. The removing of the first substrate may include etching a sacrificial layer between the first substrate and the graphene layer. After removing the first substrate, a third substrate may be attached on the device portion. After attaching the third substrate, the second substrate may be removed.
摘要:
A graphene electronic device includes: a first conductive layer (12) and a semiconductor layer (13) on a first region of an intermediate layer (11); a second conductive layer (14) on a second region of the intermediate layer; a graphene layer (15) on the intermediate layer, the semiconductor layer, and the second conductive layer; and a first gate structure (17) and a second gate structure (18) on the graphene layer.