INSULATING STRUCTURE, ELECTROSTATIC LENS, AND CHARGED PARTICLE BEAM DEVICE

    公开(公告)号:EP4415020A2

    公开(公告)日:2024-08-14

    申请号:EP24156942.5

    申请日:2024-02-09

    申请人: EBARA CORPORATION

    IPC分类号: H01J37/12

    摘要: Provided is, inter alia, an insulating structure (300) used in a vacuum for a charged particle beam device, the insulating structure comprising:
    - an anode (310); a cathode (320) facing the anode; and an insulator (330) disposed between the anode and the cathode, wherein
    - the anode (310) has an anode flat surface (311) in contact with the insulator (330),
    - the cathode (320) has:
    - a first cathode flat surface (322) that is substantially parallel to the anode flat surface (311) and has a first distance from the anode flat surface (311);
    - a second cathode flat surface (321) that is substantially parallel to the anode flat surface (311), and has a second distance from the anode flat surface (311), the second distance being smaller than the first distance; and
    - a cathode connection surface (323) that connects the first cathode flat surface (322) and the second cathode flat surface (321), and
    - the insulator (330) has:
    - a first insulator flat surface (331) in contact with the anode flat surface (311);
    - a second insulator flat surface (332) in contact with the first cathode flat surface (322) between the anode flat surface (311) and the first cathode flat surface (322);
    - a third insulator flat surface (333) between the anode flat surface (311) and the second cathode flat surface (321), having a third distance from the anode flat surface (311), the third distance being smaller than the second distance, and not in contact with the second cathode flat surface (321);
    - a first insulator connection surface (334) that connects the second insulator flat surface (332) and the third insulator flat surface (333) but is not in contact with the cathode (320); and a second insulator connection surface (335) located inside an outer peripheral end of the anode (310) and an outer peripheral end of the cathode (320) and connecting the first insulator flat surface (331) and the third insulator flat surface (333).

    SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

    公开(公告)号:EP4393607A1

    公开(公告)日:2024-07-03

    申请号:EP22861010.1

    申请日:2022-07-14

    申请人: EBARA CORPORATION

    摘要: The present invention relates to a substrate processing apparatus and a substrate processing method for suppressing cracking and chipping of a laminated substrate manufactured by bonding substrates, and more particularly to a technique of applying a filler to a gap formed between edge portions of the substrates constituting the laminated substrate. The method includes: applying the filler (F) to a gap between an edge portion (E1) of the first substrate (W1) and an edge portion (E2) of the second substrate (W2); curing the applied filler (F); generating, by an infrared imaging device (5), an image of an edge portion of the laminated substrate (Ws) to which the filler (F) is applied; and determining a filling state of the filler (F) applied to the gap between the edge portion (E1) of the first substrate (W1) and the edge portion (E2) of the second substrate (W2) based on the image.

    INTEGRALLY PORTABLE PURGE CONTAINER AND METHOD FOR USING SAME

    公开(公告)号:EP4390209A1

    公开(公告)日:2024-06-26

    申请号:EP22858379.5

    申请日:2022-08-09

    申请人: Ebara Corporation

    IPC分类号: F17C13/00 F04D13/08

    CPC分类号: F17C13/00 F04D13/08

    摘要: An integrally-transportable purge container capable of preventing entry of air when a submersible pump is carried into a pump column, and capable of warming the submersible pump when it is removed from the pump column to prevent components of the air from being liquefied is provided. The integrally-transportable purge container (1) includes: a container body (21) having an interior space (20) for accommodating a submersible pump (2) therein; an upper lid (23) configured to cover an upper opening of the container body (21); a lower lid (24) configured to cover a lower opening of the container body (21); and a purge-gas inlet port (27) and a purge-gas outlet port (28) communicating with the interior space (20) of the container body (21). The integrally-transportable purge container (1) is detachably coupled to an upper portion of a pump column (3) in which the submersible pump (2) is to be installed. The integrally-transportable purge container (1) is configured to be transportable together with the submersible pump (2).

    PURGING DEVICE AND PURGING METHOD
    5.
    发明公开

    公开(公告)号:EP4390126A1

    公开(公告)日:2024-06-26

    申请号:EP22858383.7

    申请日:2022-08-09

    申请人: EBARA CORPORATION

    摘要: A purge apparatus is provided. The purge apparatus is capable of preventing air from being entrained when a submersible pump is moved into a pump column, and capable of warming the submersible pump when the submersible pump is removed from the pump column to thereby prevent component of the air from being liquefied, thus preventing the liquefied gas from being emitted in the atmosphere. The purge apparatus includes a hermetic purge container (1) configured to accommodate the submersible pump (2) therein; a vacuum line (37) coupled to the hermetic purge container (1) and coupled to a vacuum source (39); a purge-gas supply line (38) coupled to the hermetic purge container (1) and coupled to a purge-gas supply source (40B); and a purge-gas supply valve (35) mounted to the purge-gas supply line (38).

    TOP RING OF POLISHING APPARATUS AND POLISHING APPARATUS

    公开(公告)号:EP4375012A1

    公开(公告)日:2024-05-29

    申请号:EP22845765.1

    申请日:2022-06-30

    申请人: EBARA CORPORATION

    发明人: KASHIWAGI, Makoto

    IPC分类号: B24B37/32

    CPC分类号: B24B37/32

    摘要: Provided is a technique that allows suppressing disengagement of a fitting portion of a band from a groove during the use of a top ring.
    In a top ring 10 of a polishing apparatus 100, at least one of an outer peripheral wall 11 of a retainer member 30 and an outer peripheral wall 11 of a pressing mechanism 40 is provided with a groove 15 in which fitting portions 71a, 71b of a band 70 are fitted. The groove is a dovetail groove configured to have a groove opening, a groove bottom opposed to the groove opening, a first groove side wall connecting the groove opening to the groove bottom, and a second groove side wall connecting the groove opening to the groove bottom and opposed to the first groove side wall, in cross-sectional view, and the dovetail groove is configured such that an interval between the first groove side wall and the second groove side wall widens as the interval approaches the groove bottom. The fitting portion is configured to be in contact with the first groove side wall and the second groove side wall in a state where the fitting portion of the band is fitted in the dovetail groove.

    VIBRATION-MONITORING SYSTEM FOR ROTATING MACHINE, AND VIBRATION-MONITORING METHOD FOR ROTATING MACHINE

    公开(公告)号:EP4361583A1

    公开(公告)日:2024-05-01

    申请号:EP22827893.3

    申请日:2022-01-27

    申请人: EBARA CORPORATION

    IPC分类号: G01H17/00 G01M99/00

    CPC分类号: G01H17/00 G01M99/00

    摘要: The present invention relates to a system and a method of monitoring vibrations occurring in a rotary machine. A monitoring device (5) of the vibration monitoring system includes: a display (10) configured to display sensor installation information for a vibration sensor (7); and a processor configured to process the sensor installation information. The sensor installation information includes: a type image data that represents a type of the rotary machine (1) in a form of image; a model image data that represents a model of the rotary machine (1), associated with the type of rotary machine(1), in a form of image; an installation position data that represents a recommended installation position of the vibration sensor (7), associated with the model of rotary machine (1), in a form of image; and an installation direction data that represents an appropriate installation orientation of the vibration sensor (7), associated with the recommended installation position, in a form of image. The processer (11) causes each of the type image data, the model image data, and the installation position data to be displayed on the display (10) so as to be selectable for user.