摘要:
In a semiconductor optical modulator of this invention, each quantum-well layer and each barrier layer of a quantum-well structure serving as a light absorption layer are respectively made of In 1-X-Y Ga X Al Y N (0 ≦ X, Y ≦ 1, 0 ≦ X + Y ≦ 1) and In 1-X'-Y' Ga X' Al Y' N (0 ≦ X', Y' ≦ 1, 0 ≦ X' + Y' ≦ 1). An electric field is being generated in the light absorption layer by spontaneous polarization.
摘要:
Disclosed is an electro-absorption type semiconductor optical modulator utilizing the Quantum Confinement Stark Effect, in which a quantum well structure introduced in its optical absorption layer is arranged to have a potential structuresuch that one of the electron affinity and the energy of the top of the valence band increases in the laminating direction, while the other decreases, thereby canceling the built-in field. It is intended to lower the drive voltage and to enhance an on/off ratio (extinction ratio). Thus, the absorption peak becomes narrow at a no bias state to attain a low drive voltage and an enhanced extinction ratio.
摘要:
Optical modulators include active quantum well structures (200) coherent with pseudosubstrates (100) comprising relaxed buffer layers (104, 106, 108, 110) on a silicon substrate (102). In a preferred method the active structures, consisting of Si1-x Gex barrier and well layers with different Ge contents x, are chosen in order to be strain compensated. The Ge content in the active structures may vary in a step-wise fashion along the growth direction or in the form of parabolas within the quantum well regions. Optical modulation may be achieved by a plurality of physical effects, such as the Quantum Confined or Optical Stark Effect, the Franz-Keldysh Effect, exciton quenching by hole injection, phase space filling or temperature modulation. In a preferred method the modulator structures are grown epitaxially by low-energy plasma-enhanced chemical vapor deposition (LEPCVD).
摘要翻译:光调制器包括与在硅衬底(102)上包括松弛缓冲层(104,106,108,110)的假基底(100)相干的有源量子阱结构(200)。 在优选的方法中,选择由Si 1-x Ge x势垒和具有不同Ge含量x的阱层组成的有源结构以进行应变补偿。 有源结构中的Ge含量可以沿着生长方向逐步变化,或者在量子阱区域内以抛物线的形式变化。 光学调制可以通过多种物理效应来实现,例如量子限制或光学斯塔克效应,Franz-Keldysh效应,通过空穴注入的激子猝灭,相空间填充或温度调制。 在优选的方法中,调制器结构通过低能等离子体增强化学气相沉积(LEPCVD)外延生长。
摘要:
An electro-absorption modulator and electro-absorption modulated laser are described that include a semiconductor layer having an electrically controllable absorption. The material composition of the semiconductor layer is chosen so that the semiconductor layer is substantially transparent to light propagating though the semiconductor layer when a substantially zero or a reverse bias voltage is applied across the semiconductor layer at operating temperatures of the electro-absorption modulator that are substantially greater than 25 degrees Celsius.
摘要:
A multiple quantum well light modulator is provided including a semiconductor substrate of InP, a multiple quantum well region, disposed above the InP substrate, composed of InGaAs and having a thickness of about 4 µm. The modulator is characterized by a lattice mismatch of less than 2 X 10 -4 .
摘要:
Disclosed is an electro-absorption type semiconductor optical modulator utilizing the Quantum Confinement Stark Effect, in which a quantum well structure introduced in its optical absorption layer is arranged to have a potential structuresuch that one of the electron affinity and the energy of the top of the valence band increases in the laminating direction, while the other decreases, thereby canceling the built-in field. It is intended to lower the drive voltage and to enhance an on/off ratio (extinction ratio). Thus, the absorption peak becomes narrow at a no bias state to attain a low drive voltage and an enhanced extinction ratio.
摘要:
The saturation effects observed in an MQW electro-absorption modulator are reduced by modifying the composition of the MQW structure so that the barrier layers (35,36), that are interleaved with the quantum well layers (34), are in tension.
摘要:
An optical device includes an active layer that includes at least two outer barriers and at least one coupled quantum well that is inserted between the at least two outer barriers. Each coupled quantum well includes at least three quantum well layers and at least two coupling barriers that are respectively provided between the at least three quantum well layers. Thicknesses of two quantum well layers disposed at opposite end portions of the at least three quantum well layers are less than a thickness of the other quantum well layer disposed between the two quantum well layers disposed at the opposite end portions. A bandgap of the two quantum well layers disposed at the opposite end portions may be higher than a bandgap of the other quantum well layer disposed between the two quantum well layers.