公开(公告)号：EP4509918A1

公开(公告)日：2025-02-19

申请号：EP22936720.6

申请日：2022-10-19

Applicant: Westlake University

Inventor： LI, Xijun

IPC: G03F1/00 ,  G03F1/68 ,  G02F1/01

Abstract: A mask, a lithographing apparatus, a method of manufacturing a mask and a lithographing method based on a mask. The mask includes: a substrate (110) configured to be transmissive to an exposure beam (920) for lithography, wherein the exposure beam (920) is in a first frequency band; and a photochromic layer (120) provided on one side of the substrate (110) and comprising a photochromic material, the photochromic layer being configured to generate a corresponding mask pattern under illumination of a modulation beam (930) with a spatial structure, wherein the photochromic material is in a non-light-transmitting state or a light-transmitting state to the exposure beam based on whether the photochromic material is illuminated by modulation light in the modulation beam (930), and the modulation beam (930)is in a second frequency band separated from the first frequency band.

公开(公告)号：EP3936908B1

公开(公告)日：2025-01-29

申请号：EP21184296.8

申请日：2021-07-07

Inventor： PARK, Junghyun ,  WANG, Yifei ,  BRONGERSMA, Mark L.

IPC: G02F1/01 ,  G02F1/29 ,  B82Y20/00

公开(公告)号：EP4483238A1

公开(公告)日：2025-01-01

申请号：EP23712659.4

申请日：2023-02-23

Applicant: E Ink Corporation

Inventor： HARRIS, George G. ,  PAOLINI, Richard J., Jr. ,  MARCOLIN, David Victor ,  WEI, Xianhe ,  SUBRAMANIAN, Shyamala

IPC: G02F1/1679 ,  G02F1/01

公开(公告)号：EP3912156B1

公开(公告)日：2025-01-01

申请号：EP20705564.1

申请日：2020-01-16

Inventor： PIRES ARRIFANO, Angelo, M. ,  PERTIERRA, Juan, P.

IPC: G09G3/00 ,  G02B26/06 ,  G02F1/01 ,  G09G3/36 ,  H03H1/00 ,  G03H1/04 ,  G03H1/08 ,  G03H1/22

公开(公告)号：EP3933464B1

公开(公告)日：2024-10-30

申请号：EP19916998.8

申请日：2019-08-28

Inventor： KIM, Hwi

IPC: G02F1/01 ,  G02F1/29 ,  G03H1/22 ,  H01Q15/00 ,  B82Y20/00 ,  G03H1/02

公开(公告)号：EP4449565A1

公开(公告)日：2024-10-23

申请号：EP23743612.6

申请日：2023-01-09

Applicant: IPG Photonics Corporation

Inventor： MASHKIN, Andrey ,  SHCHERBINA, Fedor ,  ZAYTSEV, Ilya

IPC: H01S3/102 ,  H01S3/067 ,  G02F1/01

公开(公告)号：EP4449171A2

公开(公告)日：2024-10-23

申请号：EP22908508.9

申请日：2022-12-16

Applicant: Magic Leap, Inc.

Inventor： SINGH, Vikramjit ,  TRAUB, Matthew ,  MENEZES, Marlon Edward ,  LIU, Yingnan ,  XU, Frank Y.

IPC: G02B6/02 ,  G02F1/01 ,  G02B27/01 ,  G06V20/20

公开(公告)号：EP3961278B1

公开(公告)日：2024-10-16

申请号：EP20207845.7

申请日：2020-11-16

Inventor： PARKER, John

IPC: G02B6/125 ,  G02F1/01 ,  G02F1/225 ,  G02F1/313

公开(公告)号：EP3845964B1

公开(公告)日：2024-10-09

申请号：EP19853360.6

申请日：2019-08-08

IPC: G03B21/14 ,  G02B5/18 ,  G02B5/30 ,  G02B26/08 ,  G02B27/28 ,  G02F1/01 ,  G09G3/20 ,  G09G3/34 ,  G09G3/36 ,  H04N5/74 ,  H04N9/31

CPC classification number: G02B5/18 ,  G02B5/30 ,  G02B26/08 ,  G02B27/28 ,  G02F1/01 ,  G03B21/14 ,  G09G3/20 ,  G09G3/36 ,  G09G3/34 ,  H04N9/3126 ,  H04N9/3164 ,  H04N9/3167 ,  H04N9/3161

公开(公告)号：EP4433867A1

公开(公告)日：2024-09-25

申请号：EP22814173.5

申请日：2022-11-18

Applicant: Lionix International BV

Inventor： HEIDEMAN, René Gerrit ,  EVERHARDT, Arnoud Sebastiaan ,  EPPING, Jörn Philipp ,  SCHREUDER, Erik ,  TRAN, Thi Lan Anh

IPC: G02F1/01

CPC classification number: G02F1/0134