摘要:
An output circuit device for detecting and converting signal charge transferred thereto from a charge transfer section of a CCD into a signal voltage is constructed such that a gate oxide film of a driving side MOS transistor of a first stage source follower which receives signal charge is formed as a thinner film than gate oxide films of the other MOS transistors in the same circuit to reduce the 1/f noise. A first diffusion layer in which phosphor of a low concentration is diffused is formed in a semiconductor body, and a second diffusion layer in which arsenic or antimony of a high concentration is formed in a portion of the upper face of the first diffusion layer. Further, a third diffusion layer in which phosphor of a high concentration is formed in the range of the second diffusion layer on the surface of the semiconductor body in a deeper condition than the first diffusion layer is formed. The resisting property against an aluminum spike at a junction between the diffusion layer and a wiring line is improved and an increase of the capacitance of the diffusion layer is suppressed.
摘要:
An apparatus is disclosed for processing the output signals of a charge transfer device having at least one row of photoelectric elements. The charge transfer device produces output signals with charge levels that are provided to a shift register having a plurality of elements. The successive charge levels from each photoelectric element are provided to respective shift register elements, and the charge levels are transferred within the shift register to a readout terminal. A sample and hold device removes sampling artifacts inherent in the signal provided by the CCD, to produce a signal representing successive image pixel values. A peaking filter emphasizes high frequency components relative to low frequency components, to compensate for low pass filtering effects which may occur in the CCD.
摘要:
A charge coupled device (10) having a layer (16) of a semiconductor material on a surface (14) of a substrate body (12) of a semiconductor material. The layer (16) is of a material which can be epitaxially deposited on the body with good crystalline quality. The material of the layer (16) has a conduction band and/or valence band which is different from that of the body (12) so as to provide a discontinuity in the energy level of the conduction band and/or valance band at the junction of the layer (16) and the body (12) during the operation of the charge coupled device. At least one electrode (20) is over and insulated from the layer (16). The discontinuity in the conduction band and/or valence band creates a well in which photogenerated charge is collected.
摘要:
A charge coupled device (10) having a layer (16) of a semiconductor material on a surface (14) of a substrate body (12) of a semiconductor material. The layer (16) is of a material which can be epitaxially deposited on the body with good crystalline quality. The material of the layer (16) has a conduction band and/or valence band which is different from that of the body (12) so as to provide a discontinuity in the energy level of the conduction band and/or valance band at the junction of the layer (16) and the body (12) during the operation of the charge coupled device. At least one electrode (20) is over and insulated from the layer (16). The discontinuity in the conduction band and/or valence band creates a well in which photogenerated charge is collected.
摘要:
L'invention concerne les dispositifs à transfert de charges, et tout spécialement les matrices et les barrettes photosensibles. Ces dispositifs sont réalisés sur un substrat semiconducteur portant des grilles servant à effectuer les transferts de charge en fonction des séquences de potentiels qu'elles reçoivent. Ces potentiels sont référencés par rapport à un potentiel de référence, par exemple la masse, et en général le substrat est relié à la masse par un contact ohmique métallisé en face arrière du substrat. Pour les matrices photosensibles sur substrat aminci, on utilise un contact ohmique en face avant, mais cela nécessite des opérations technologiques supplémentaires. Selon l'invention, on a constaté qu'on pouvait relier le substrat (10, 12) au potentiel de référence (M) non pas par un contact ohmique mais par un contact redresseur, par exemple par l'intermédiaire d'une jonction PN (30, 40, 12). Le substrat n'est plus à potentiel fixe, mais le fonctionnement n'est en général pas perturbé. De plus, certains défauts tels que les "points blancs" de matrices photosensibles sont éliminés.
摘要:
A charge transfer device is fabricated on an n-type semiconductor substrate (21) and comprises a p-well (22) formed in a surface portion of the semiconductor substrate, an n-type charge transfer region (23) formed in a surface portion of the well, an n-type floating diffusion region (24) formed in the surface portion of the well and contiguous to the charge transfer region, an insulating film (30) covering the surface portion of the well, and a plurality of gate electrodes (31 to 36) provided on the insulating film and applied with driving clocks in such a manner as to produce conductive channels in the charge transfer region for transferring electric charges toward the floating diffusion region, in which the conductive channels in the vicinity of the floating diffusion region are gradually decreased in width toward the floating diffusion region, and in which impurity atoms of the well beneath the charge transfer region in the vicinity of the floating diffusion region are graded toward the floating diffusion region, so that the electric charges are allowed to swept thereinto without any residual.
摘要:
An output circuit device for detecting and converting signal charge transferred thereto from a charge transfer section of a CCD into a signal voltage is constructed such that a gate oxide film of a driving side MOS transistor of a first stage source follower which receives signal charge is formed as a thinner film than gate oxide films of the other MOS transistors in the same circuit to reduce the 1/f noise. A first diffusion layer in which phosphor of a low concentration is diffused is formed in a semiconductor body, and a second diffusion layer in which arsenic or antimony of a high concentration is formed in a portion of the upper face of the first diffusion layer. Further, a third diffusion layer in which phosphor of a high concentration is formed in the range of the second diffusion layer on the surface of the semiconductor body in a deeper condition than the first diffusion layer is formed. The resisting property against an aluminum spike at a junction between the diffusion layer and a wiring line is improved and an increase of the capacitance of the diffusion layer is suppressed.