摘要:
A charge-coupled device (10) includes an array (12) of closely spaced electrodes aligned along a lateral path on an oxide layer (14) covering a semiconductor substrate (16). A portion of a channel region (18) in the substrate below each electrode has a tilted potential gradient providing an electrical field assisting lateral charge carrier drift within the channel region (18).
摘要:
A charge coupled device (10) having a layer (16) of a semiconductor material on a surface (14) of a substrate body (12) of a semiconductor material. The layer (16) is of a material which can be epitaxially deposited on the body with good crystalline quality. The material of the layer (16) has a conduction band and/or valence band which is different from that of the body (12) so as to provide a discontinuity in the energy level of the conduction band and/or valance band at the junction of the layer (16) and the body (12) during the operation of the charge coupled device. At least one electrode (20) is over and insulated from the layer (16). The discontinuity in the conduction band and/or valence band creates a well in which photogenerated charge is collected.
摘要:
A charge coupled device (10) having a layer (16) of a semiconductor material on a surface (14) of a substrate body (12) of a semiconductor material. The layer (16) is of a material which can be epitaxially deposited on the body with good crystalline quality. The material of the layer (16) has a conduction band and/or valence band which is different from that of the body (12) so as to provide a discontinuity in the energy level of the conduction band and/or valance band at the junction of the layer (16) and the body (12) during the operation of the charge coupled device. At least one electrode (20) is over and insulated from the layer (16). The discontinuity in the conduction band and/or valence band creates a well in which photogenerated charge is collected.
摘要:
Capteur d'image de zone du type à transfert d'interligne dans lequel une charge produite par de la lumière est transférée d'un pixel dans un dispositif de transfert de charges (CCD) ou un registre de décalage. La structure du CCD se compose typiquement de deux niveaux de chevauchement ou plus d'électrodes de polysilicium associées à chaque rangée de pixels. L'invention concerne un CCD de structure simplifiée présentant par conséquent une aptitude à la fabrication améliorée. Ledit CCD utilise des régions de barrière aux ions implantées, pouvant être auto-alignées comme cela est décrit par Losee et al. brevet US 4,613,402, afin de produire un dispositif doté d'une seule électrode en polysilicium associée à chaque pixel.
摘要:
De manière connue, le dispositif comporte en amont sur un substrat semi-conducteur (1) dopé d'un premier type (P), une couche semi-conductrice (2) dopée d'un deuxième type (N) et une couche isolante (3) recouvrant la couche (2). Des paires d'électrodes (P1, P2) sont formées sur la couche isolante. Chaque paire comporte une électrode de transfert (4) et une électrode de stockage (5). Des zones dopées (15) de troisième type (N⁻) sont réalisées dans la couche de deuxième type (N). Selon l'invention, une couche dopée (16) de troisième type (N⁻) est réalisée en aval, dans la couche (2) de deuxième type, et on forme en aval au moins une autre paire (17, 18) d'électrodes supplémentaires de transfert et de stockage. Une zone dopée (19) de quatrième type (N⁻⁻) est réalisée sous l'électrode supplémentaire de transfert (17), dans la couche (16) de troisième type (N⁻). Cette paire d'électrodes supplémentaires (17, 18) et la zone (19) dopée de quatrième type permettent d'obtenir l'abaissement de potentiel de transfert en sortie.
摘要:
The present invention is directed to a method of making a true two-phase CCD using a single layer (level) of the conductive material for the gate electrodes to provide a planar structure. The method includes using L-shaped masking layers having a submicron length of a bottom portion between two masking layers of silicon dioxide on and spaced along a surface of a conductive layer. The conductive layer is over and insulated from a surface of a body of a semiconductor material having a channel region therein. The L-shaped masking layers are removed to expose a spaced narrow portions of the conductive layer. The conductive layer is then etched completely therethrough at each exposed portion to divide the conductive layer into gate electrodes which are spaced apart by submicron width gaps.
摘要:
The charge transfer efficiency of a two-phase charge-coupled device cell is enhanced by providing a three-tiered built-in potential in the channel of each cell. Two lower potential tiers form a trenched potential well in the cell for storing charge. A higher potential tier between the trenched potential well of a cell and the potential well of a preceding neighbor cell provides a potential barrier preventing backflow of charge from well-to-well. The potential trench is located at the downstream end of the well adjacent a succeeding neighbor cell of the CCD.
摘要:
A charge-coupled device (10) includes an array (12) of closely spaced electrodes aligned along a lateral path on an oxide layer (14) covering a semiconductor substrate (16). A portion of a channel region (18) in the substrate below each electrode has a tilted potential gradient providing an electrical field assisting lateral charge carrier drift within the channel region (18).