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14 条记录 (耗时 0.009 秒)

    High frequency plasma generation apparatus
    2.
    发明公开
    High frequency plasma generation apparatus 失效
    Hochfrequenzplasmagenerator。

    公开(公告)号：EP0184812A2

    公开(公告)日：1986-06-18

    申请号：EP85115668.7

    申请日：1985-12-09

    申请人： HITACHI, LTD.

    发明人： Ohno, Yasunori ,  Kurosawa, Tomoe ,  Sato, Tadashi ,  Ohshita, Youichi

    IPC分类号： H05H1/46 ,  H05H1/11

    CPC分类号： H01J37/321 ,  H01J37/32623 ,  H01J37/32688 ,  H05H1/11

    摘要： In a high frequency plasma generation apparatus used in a reactive ion etching apparatus, an ion shower apparatus, a sputter apparatus, etc. for fabricating thin films or semiconductor devices for which fine patterning process is required, electrical breakdown is apt to be provoked at the surface of a high frequency coil (8), because the high frequency coil (8) is usually inserted in a plasma. In order to remove this drawback, according to this invention, the high frequency coil (8) is disposed in the plasma production chamber (1) at the neighborhood of the cylindrical side wall (20), and thus a plasma confinment domain (12) is formed inside of this high frequency coil (8) by means of a magnetic field production means (3) which generates a multi-cusp magnetic field so that the plasma confinement domain (12) is separated from the high frequency coil (8). In this way electrical breakdown on the surface of the high frequency coil (8) is prevented and thus the apparatus according to this invention can work stably for a long time.

    摘要翻译： 在用于反应离子蚀刻装置的高频等离子体产生装置中，用于制造需要精细图案化工艺的薄膜或半导体器件的离子淋浴装置，溅射装置等，易于在 高频线圈（8）的表面，因为高频线圈（8）通常插入等离子体中。 为了消除这个缺陷，根据本发明，高频线圈（8）在圆筒形侧壁（20）附近设置在等离子体生产室（1）中，因此等离子体封闭区域（12） 通过产生多尖点磁场的磁场产生装置（3）形成在该高频线圈（8）的内部，使得等离子体限制区域（12）与高频线圈（8）分离。 以这种方式防止高频线圈（8）的表面上的电击穿，因此根据本发明的装置可以长时间稳定工作。

    MAGNETIC MIRROR MACHINE
    5.
    发明公开
    MAGNETIC MIRROR MACHINE 审中-公开

    公开(公告)号：EP4394799A1

    公开(公告)日：2024-07-03

    申请号：EP22217136.5

    申请日：2022-12-29

    申请人： Novatron Fusion Group AB

    发明人： JÄDERBERG, Jan

    IPC分类号： G21B1/05 ,  G21B1/11 ,  H05H1/11 ,  H01F6/06

    CPC分类号： G21B1/05 ,  G21B1/11 ,  H01F6/06 ,  H05H1/10

    摘要： A magnetic mirror machine (200), comprises a first inner coil (104) arranged to carry a current in a first direction; and a second inner coil (105) offset in an axial direction from said first inner coil (104) and arranged to carry a current in a second direction opposite to said first direction. The mirror machine (200) further comprises a first outer coil (210) located radially outside said first inner coil (104) and arranged to carry a current in said second direction; and a second outer coil (212) located radially outside said second inner coil (105) and arranged to carry a current in said first direction.

    METHOD AND APPARATUS FOR CONTROLLING CHARGED PARTICLES.
    6.
    发明公开
    METHOD AND APPARATUS FOR CONTROLLING CHARGED PARTICLES. 失效
    VERFAHREN UND VORRICHTUNG ZUR REGELUNG GELADENER TEILCHEN。

    公开(公告)号：EP0242398A4

    公开(公告)日：1987-11-30

    申请号：EP86907061

    申请日：1986-10-29

    申请人： ENERGY MATTER CONVERSION CORP

    发明人： BUSSARD ROBERT W

    IPC分类号： H05H1/02 ,  H05H1/03 ,  H05H1/11 ,  G21B1/02

    CPC分类号： H05H1/03 ,  H05H1/02 ,  H05H1/11

    摘要： The charged particles comprise electrons and positive ions. A magnetic field having only point cusps is used to confine injected electrons and so to generate a negative potential well (600). Positive ions injected into the negative potential well are trapped therein. The preferred means for generating the magnetic field is current-carrying elements (800) arranged at positions corresponding to the edges of any of several truncated regular polyhedrons.

    摘要翻译： 带电粒子包含电子和正离子。 仅具有尖点的磁场用于限制注入的电子，从而产生负电位阱（600）。 注入负电位阱的正离子被捕获在其中。 用于产生磁场的优选装置是载流元件（800），其布置在对应于几个截头正多面体中的任一个的边缘的位置处。

    Plasma devices
    8.
    发明公开
    Plasma devices 失效
    用于封闭的等离子体的装置。

    公开(公告)号：EP0075953A1

    公开(公告)日：1983-04-06

    申请号：EP82109022.2

    申请日：1982-09-29

    申请人： KABUSHIKI KAISHA TOSHIBA

    发明人： Kageyama, Katsuhiro

    IPC分类号： H05H1/11

    CPC分类号： H05H1/11

    摘要： Plasma apparatus comprises a vacuum vessel, a device for creating an open-ended magnetic field containing a plasma, a device for controlling a potential of a space in which the plasma is confined, a plurality of electrostatic plugs disposed at the open-ended portions of the magnetic field. At least one of the electrostatic plugs comprises a limiter attached to the vacuum vessel, provided with an inner hollow portion and arranged so as to confine the plasma, an anode electrode disposed at the open-ended portion and provided with an inner hollow portion extending along a direction of the open-ended magnetic field, a cathode electrode disposed with space from the anode electrode on the side opposite to the limiter and coaxially with the anode .electrode and the limiter, a control electrode passing through a through hole provided for the cathode electrode and extending into the hollow portion of the anode electrode, and electric power applying means so that potentials are applied to the anode electrode, the control electrode, the limiter, and the cathode electrode so as to have higher magnitudes in the stated order.

    MAGNETIC MIRROR MACHINE
    10.
    发明公开
    MAGNETIC MIRROR MACHINE 审中-公开

    公开(公告)号：EP4394798A1

    公开(公告)日：2024-07-03

    申请号：EP22217134.0

    申请日：2022-12-29

    申请人： Novatron Fusion Group AB

    发明人： HOLMBERG, Rickard ,  JÄDERBERG, Jan

    IPC分类号： G21B1/05 ,  G21B1/11 ,  H05H1/11 ,  H01F6/00

    CPC分类号： G21B1/05 ,  G21B1/11 ,  H05H1/10 ,  H01F6/06 ,  H01F5/00

    摘要： A magnetic mirror machine for plasma confinement comprises a plurality of electromagnetic coils each circularly symmetric with respect to a common symmetry axis and disposed along said symmetry axis for creating an open-field-line plasma confinement area limited by a plurality of mirror areas of increased magnetic flux density relative to a central area of said plasma confinement area, wherein said magnetic mirror machine further comprises at least one further electromagnetic coil, wherein said further electromagnetic coil crosses a plane of an electromagnetic coil of said plurality of electromagnetic coils through said electromagnetic coil.