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1330 条记录 (耗时 0.035 秒)

    Exposure apparatus, exposure method, and method for producing device
    91.
    发明公开
    Exposure apparatus, exposure method, and method for producing device 有权

    公开(公告)号：EP2466621A3

    公开(公告)日：2012-11-21

    申请号：EP12159205.9

    申请日：2004-02-26

    申请人： Nikon Corporation

    发明人： Nagasaka, Hiroyuki ,  Nishii, Yasufumi

    IPC分类号： H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/708 ,  G03F7/7095

    摘要： An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid 1 onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism 10 which supplies the liquid onto the substrate to form a liquid immersion area AR2 on a part of the substrate. The liquid supply mechanism supplies the liquid 1 onto the substrate P simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area AR1. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.

    LIQUID IMMERSION MEMBER, METHOD FOR MANUFACTURING LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
    92.
    发明公开
    LIQUID IMMERSION MEMBER, METHOD FOR MANUFACTURING LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
    液体浸渍体，产生液体浸渍体，曝光装置及装置的制造方法方法

    公开(公告)号：EP2521163A1

    公开(公告)日：2012-11-07

    申请号：EP10840919.4

    申请日：2010-12-21

    申请人： Nikon Corporation

    发明人： TAKI Yusuke

    IPC分类号： H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/7095

    摘要： A liquid immersion member (6) holds liquid (LQ) between the liquid immersion member and an object such that an optical path (K) of exposure light (EL) applied to the object is filled with the liquid (LQ), thereby forming a liquid immersion space (LS). In the liquid immersion member (6), an amorphous carbon film is formed on at least a part of a region coming into contact with the liquid (LQ).

    摘要翻译： 甲液浸构件（6）保持的液浸构件之间以及对象搜索没有施加到对象填充有液体（LQ）的光路的曝光光的（K）（EL）液体（LQ），由此形成 液浸空间（LS）。 在液浸构件（6），以无定形碳薄膜形成是在至少进入与液体（LQ）接触的区域的一部分。

    Exposure apparatus, exposure method, and method for producing device
    95.
    发明公开
    Exposure apparatus, exposure method, and method for producing device 有权

    公开(公告)号：EP2466624A2

    公开(公告)日：2012-06-20

    申请号：EP12159208.3

    申请日：2004-02-26

    申请人： Nikon Corporation

    发明人： Nagasaka, Hiroyuki

    IPC分类号： H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/708 ,  G03F7/7095

    摘要： An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid 1 onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism 10 which supplies the liquid onto the substrate to form a liquid immersion area AR2 on a part of the substrate. The liquid supply mechanism supplies the liquid 1 onto the substrate P simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area AR1. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.

    Exposure apparatus, exposure method, and method for producing device
    96.
    发明公开
    Exposure apparatus, exposure method, and method for producing device 有权

    公开(公告)号：EP2466622A2

    公开(公告)日：2012-06-20

    申请号：EP12159206.7

    申请日：2004-02-26

    申请人： Nikon Corporation

    发明人： Nagasaka, Hiroyuki ,  Owa, Soichi

    IPC分类号： H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/708 ,  G03F7/7095

    摘要： An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid 1 onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism 10 which supplies the liquid onto the substrate to form a liquid immersion area AR2 on a part of the substrate. The liquid supply mechanism supplies the liquid 1 onto the substrate P simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area AR1. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.

    Exposure apparatus, exposure method, and method for producing device
    97.
    发明公开
    Exposure apparatus, exposure method, and method for producing device 有权
    Belichtungsvorrichtung，Belichtungsverfahren und Verfahren zur Herstellung desGeräts

    公开(公告)号：EP2466621A2

    公开(公告)日：2012-06-20

    申请号：EP12159205.9

    申请日：2004-02-26

    申请人： Nikon Corporation

    发明人： Nagasaka, Hiroyuki ,  Nishii, Yasufumi

    IPC分类号： H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/708 ,  G03F7/7095

    摘要： An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid 1 onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism 10 which supplies the liquid onto the substrate to form a liquid immersion area AR2 on a part of the substrate. The liquid supply mechanism supplies the liquid 1 onto the substrate P simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area AR1. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.

    摘要翻译： 曝光装置EX通过将预定图案的图像通过液体1投影到基板上来曝光基板P. 曝光装置包括执行投影的投影光学系统和液体供应机构10，其将液体供应到基板上，以在基板的一部分上形成液浸区域AR2。 液体供给机构从多个不同方向从投影区域AR1分离的多个位置同时向液体1供给液体1。 曝光装置能够稳定地形成液浸区域并且令人满意地回收液体。 可以精确地进行曝光处理，同时避免例如液体流向周围环境。

    Exposure apparatus and method for producing device
    98.
    发明公开
    Exposure apparatus and method for producing device 审中-公开
    液浸曝光装置，Washverfahren以及用于制造器件的方法

    公开(公告)号：EP2466620A2

    公开(公告)日：2012-06-20

    申请号：EP12155100.6

    申请日：2004-05-24

    申请人： Nikon Corporation

    发明人： KOBAYASHI, Naoyuki ,  TANIMOTO, Akikazu ,  MIZUNO, Yasushi ,  SHIRAISHI, Kenichi

    IPC分类号： H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

    摘要： There is provided an exposure apparatus (EX) capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate (P) via a projection optical system (PL) and the liquid (1). The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism (40) which removes the liquid remaining on a part (7) arranged in the vicinity of the image plane of the projection optical system.

    摘要翻译： 有被提供给曝光装置（EX），其能够形成通过去除不必要的液体当通过投影图案施加到通过投影光学系统（PL）与液（1）在基板（P）进行曝光所希望的器件图案的。 曝光装置突出的图案的图像投影到通过投影光学系统和液体中的底物，以暴露衬底。 曝光装置包括液体去除机构（40）除去残留在所述投影光学系统的像平面附近布置的部分（7）的液体。