公开(公告)号：EP2495613B1

公开(公告)日：2013-07-31

申请号：EP12169023.4

申请日：2003-11-10

申请人： ASML Netherlands B.V.

发明人： Lof, Joeri ,  De Smit, Joannes Theodoor ,  Straaijer, Alexander ,  Streefkerk, Bob ,  Van Santen, Helmar ,  Derksen, Antonius ,  Hoogendam, Christiaan ,  Kolesnychenko, Aleksey ,  Loopstra, Erik ,  Modderman, Theodorus ,  Mulkens, Johannes ,  Ritsema, Roelof ,  Simon, Klaus

IPC分类号： G03F7/20

CPC分类号： G03F7/707 ,  G03F7/70341 ,  G03F7/7085 ,  G03F9/7088

公开(公告)号：EP1486828A2

公开(公告)日：2004-12-15

申请号：EP04253354.7

申请日：2004-06-04

申请人： ASML Netherlands B.V.

发明人： Lof, Joeri ,  Bijlaart, Erik Theodorus Maria ,  Butler, Hans ,  Donders, Sjoerd Nicolaas Lamburtus ,  Hoogendam, Christiaan Alexander ,  Kolesnychenko, Aleksey ,  Loopstra, Erik Roelof ,  Meijer, Hendricus Johannes Maria ,  Mertens, Jeroen Johannes Sophia Maria ,  Van de Kerkhof, Marcus Adrianus ,  Mulkens, Johannes Catharinus Hubertus ,  Ritsema, Roelof Aeiko Siebrand ,  Van Schaik, Frank ,  Sengers, Timotheus Franciscus ,  Simon, Klaus ,  De Smit, Joannes Theodoor ,  Straaijer, Alexander ,  Streefkerk, Bob ,  Van Santen, Helmar ,  Kroon, Mark ,  Den Boef, Arie Jeffrey ,  Ottens, Joost Jeroen

IPC分类号： G03F7/20

CPC分类号： G03F9/7088 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/7085

摘要： A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and a sensor is filled with a liquid.

摘要翻译： 公开了一种光刻投影设备，其中投影系统的最终元件和传感器之间的空间填充有液体。

公开(公告)号：EP2267536B1

公开(公告)日：2017-04-19

申请号：EP10180248.6

申请日：2004-10-26

申请人： ASML Netherlands B.V.

发明人： Hoogendam, Christiaan ,  Bijlaart, Erik ,  Kolesnychenko, Aleksey ,  Loopstra, Erik ,  Mertens, Jeroen ,  Mulkens, Johannes ,  Slaghekke, Bernardus ,  Streefkerk, Bob ,  Tinnemans, Patricius ,  Van Santen, Helmar

IPC分类号： G03F7/20

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70866

公开(公告)号：EP1429188A3

公开(公告)日：2004-10-13

申请号：EP03257068.1

申请日：2003-11-10

申请人： ASML Netherlands B.V.

发明人： Lof, Joeri ,  Bijlaart, Erik Theodorus Maria ,  Butler, Hans ,  Donders, Sjoerd Nicolaas Lambertus ,  Hoogendam, Christiaan Alexander ,  Kolesnychenko, Aleksey ,  Loopstra, Erik Roelof ,  Meijer, Hendricus Johannes Maria ,  Mertens, Jeroen Johannes Sophia Maria ,  Mulkens, Johannes Catharinus Hubertus ,  Ritsema, Roelof Aeilko Siebrand ,  Van Schaik, Frank ,  Sengers, Timotheus Franciscus ,  Simon, Klaus ,  De Smit, Joannes Theodoor ,  Straaijer, Alexander ,  Streefkerk, Bob ,  Van Santen, Helmar

IPC分类号： G03F7/20

CPC分类号： G03F7/707 ,  G03F7/70341 ,  G03F7/7085

摘要： A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and the substrate is filled with a liquid. An edge seal member 17, 117 at least partly surrounds the substrate W or other object on the substrate table WT to prevent catastrophic liquid loss when edge portions of the substrate or are imaged or illuminated.

摘要翻译： 公开了一种光刻投影设备，其中投影系统的最终元件和衬底之间的空间填充有液体。 边缘密封构件17,117至少部分地围绕衬底W或衬底台WT上的其他物体，以防止当衬底的边缘部分成像或照射时的灾难性液体损失。

公开(公告)号：EP1403715A2

公开(公告)日：2004-03-31

申请号：EP03256103.7

申请日：2003-09-29

申请人： ASML Netherlands B.V.

发明人： Kurt, Ralph ,  Kolesnychenko, Aleksey

IPC分类号： G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70925

摘要： A lithographic apparatus having means for supplying to a space in the apparatus at least one of one or more perhalogenated C 1 -C 6 alkanes and one or more compounds consisting essentially of one or more nitrogen atoms and one or more atoms selected from hydrogen, oxygen and halogen. The activation of the alkane(s) and compound(s) by application of suitable activating means provides reactive species which are capable of highly selective etching of hydrocarbon species whilst minimising damage to sensitive optical surfaces.

摘要翻译： 一种光刻设备，具有用于向设备中的空间供应一种或多种全卤代C 1 -C 6烷烃和一种或多种基本上由一个或多个氮原子和一个或多个选自氢，氧和卤素的原子组成的化合物 。 通过应用合适的活化手段活化烷烃和化合物提供了反应性物质，其能够高度选择性地刻蚀烃物质，同时使对敏感光学表面的损害最小化。

公开(公告)号：EP2259139A1

公开(公告)日：2010-12-08

申请号：EP10180289.0

申请日：2004-12-15

申请人： ASML Netherlands B.V.

发明人： Van Santen, Helmar ,  Kolesnychenko, Aleksey

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/7085

摘要： A liquid supply system (24) for an immersion lithographic projection apparatus is disclosed in which a space (5) is defined between the projection system (PL), a barrier member (10) and a substrate (W). The barrier member (10) is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member (10) and the substrate (W).

摘要翻译： 公开了一种用于浸没式光刻投影装置的液体供应系统（24），其中在投影系统（PL），阻挡构件（10）和基板（W）之间限定空间（5）。 阻挡构件（10）不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件（10）和基板（W）之间。

公开(公告)号：EP1403715A3

公开(公告)日：2006-01-18

申请号：EP03256103.7

申请日：2003-09-29

申请人： ASML Netherlands B.V.

发明人： Kurt, Ralph ,  Kolesnychenko, Aleksey

IPC分类号： G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70925

摘要： A lithographic apparatus having means for supplying to a space in the apparatus at least one of one or more perhalogenated C 1 -C 6 alkanes and one or more compounds consisting essentially of one or more nitrogen atoms and one or more atoms selected from hydrogen, oxygen and halogen. The activation of the alkane(s) and compound(s) by application of suitable activating means provides reactive species which are capable of highly selective etching of hydrocarbon species whilst minimising damage to sensitive optical surfaces.

公开(公告)号：EP1486828A3

公开(公告)日：2005-08-10

申请号：EP04253354.7

申请日：2004-06-04

申请人： ASML Netherlands B.V.

发明人： Lof, Joeri ,  Bijlaart, Erik Theodorus Maria ,  Butler, Hans ,  Donders, Sjoerd Nicolaas Lamburtus ,  Hoogendam, Christiaan Alexander ,  Kolesnychenko, Aleksey ,  Loopstra, Erik Roelof ,  Meijer, Hendricus Johannes Maria ,  Mertens, Jeroen Johannes Sophia Maria ,  Van de Kerkhof, Marcus Adrianus ,  Mulkens, Johannes Catharinus Hubertus ,  Ritsema, Roelof Aeiko Siebrand ,  Van Schaik, Frank ,  Sengers, Timotheus Franciscus ,  Simon, Klaus ,  De Smit, Joannes Theodoor ,  Straaijer, Alexander ,  Streefkerk, Bob ,  Van Santen, Helmar ,  Kroon, Mark ,  Den Boef, Arie Jeffrey ,  Ottens, Joost Jeroen

IPC分类号： G03F7/20

CPC分类号： G03F9/7088 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/7085

摘要： A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and a sensor is filled with a liquid.

摘要翻译： 公开了一种光刻投影装置，其中投影系统的最终元件和传感器之间的空间被填充有液体。

公开(公告)号：EP1429188A2

公开(公告)日：2004-06-16

申请号：EP03257068.1

申请日：2003-11-10

申请人： ASML Netherlands B.V.

发明人： Lof, Joeri ,  Bijlaart, Erik Theodorus Maria ,  Butler, Hans ,  Donders, Sjoerd Nicolaas Lambertus ,  Hoogendam, Christiaan Alexander ,  Kolesnychenko, Aleksey ,  Loopstra, Erik Roelof ,  Meijer, Hendricus Johannes Maria ,  Mertens, Jeroen Johannes Sophia Maria ,  Mulkens, Johannes Catharinus Hubertus ,  Ritsema, Roelof Aeilko Siebrand ,  Van Schaik, Frank ,  Sengers, Timotheus Franciscus ,  Simon, Klaus ,  De Smit, Joannes Theodoor ,  Straaijer, Alexander ,  Streefkerk, Bob ,  Van Santen, Helmar

IPC分类号： G03F7/20

CPC分类号： G03F7/707 ,  G03F7/70341 ,  G03F7/7085

摘要： A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and the substrate is filled with a liquid. An edge seal member 17, 117 at least partly surrounds the substrate W or other object on the substrate table WT to prevent catastrophic liquid loss when edge portions of the substrate or are imaged or illuminated.

摘要翻译： 公开了一种光刻投影装置，其中投影系统的最终元件和基板之间的空间被填充有液体。 边缘密封构件17,117至少部分地围绕衬底W或衬底台WT上的其它物体，以防止衬底的边缘部分或成像或照明时的灾难性液体损失。

公开(公告)号：EP2259139B1

公开(公告)日：2017-08-23

申请号：EP10180289.0

申请日：2004-12-15

申请人： ASML Netherlands B.V.

发明人： Van Santen, Helmar ,  Kolesnychenko, Aleksey

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/7085

摘要： A liquid supply system (24) for an immersion lithographic projection apparatus is disclosed in which a space (5) is defined between the projection system (PL), a barrier member (10) and a substrate (W). The barrier member (10) is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member (10) and the substrate (W).

摘要翻译： 公开了一种用于浸没式光刻投影设备的液体供给系统（24），其中在投影系统（PL），阻挡构件（10）和衬底（W）之间限定空间（5）。 阻挡构件（10）未被密封，使得在使用期间允许浸没液体流出阻挡构件（10）和基底（W）之间的空间。