摘要:
The invention relates to a treatment device (1) for the single-stage treatment of a metal object (2) to be treated. The treatment has at least the steps of pickling and phosphating the object (2) to be treated. The treatment device (1) comprises at least the following devices: a treatment container (4) for receiving the object (2) to be treated and for receiving a flowable treatment substance (6); and a pump device (10) for exchanging at least a fraction of the treatment substance (6). The treatment substance (6) flows around at least one part of the object (2) to be treated, in particular the entire object (2) to be treated. The treatment substance (6) is a phosphor- or phosphate-containing solution, in particular phosphoric acid. The phosphor- or phosphate-containing solution consists partly of water and partly of a reaction substance, and the reaction substance consists of phosphor or a phosphate and an additional treatment effect-improving substance. The proportion of the phosphor or the phosphate in the reaction substance is at least 95%, and the reaction substance does not have a salt acid or sulfuric acid content.
摘要:
A bearing cleaning assembly (200) comprising a tube (210) having a first end and a second end, the first end including an entry port for receiving cleaning fluid therethrough, a piston (211) adapted to move reciprocatingly inside the tube, the piston connected to a rod that emerges from the second end of the tube and terminates in a handle, an air vent (2013) formed at the second end, a first conical member (215) connected to the first end for directing cleaning fluid into the entry port, and a second conical member (216) adapted to be submerged in cleaning fluid (214) and to support a bearing (201) in need of cleaning, wherein, in use, the bearing is sandwiched between the first and second conical members in the cleaning fluid, and the piston is withdrawn to draw cleaning fluid into the tube through the entry port, during which cleaning fluid is also drawn through and around the bearing so as to clean the bearing.
摘要:
Die Oberflächenbehandlungsanlage weist eine Aufgabestation (4), eine Vorbehandlungsvorrichtung (5) zum wässrigen Vorbehandeln von zu beschichtenden Teilen und eine Transportvorrichtung (2) auf, die zu beschichtende Teile (3) von der Aufgabestation (4) durch die Vorbehandlungsvorrichtung (5) zu einer Beschichtungsvorrichtung (1) transportiert. Die Vorbehandlungsvorrichtung (5) umfasst eine Mehrzahl parallel geschalteter Vorbehandlungskammern (5a, 5b, 5c, 5d), wobei die Transportvorrichtung (2) sich vor der Vorbehandlungsvorrichtung (5) in wenigstens zwei jeweils zu verschiedenen, parallel angeordneten Vorbehandlungskammern (5a, 5b) führende Transportwege (2a, 2b) aufteilt.
摘要:
Blockages of turbomachine cooling circuit cooling holes 12 resulting from coating processes can be removed by introducing a cleaning agent into the cooling circuit 14. The cooling circuit 14 can be connected to a cleaning agent supply 16 under pressure, adding force on the blockage to chemical action by the cleaning agent. The cleaning agent is chemically reactive with the coating material 24 and substantially chemically non-reactive with the underlying material of the cooling circuit 14 and other parts of the turbomachine. A neutralization agent can also be introduced to reduce toxicity and/or action of the cleaning agent.
摘要:
In a rotating drum (4) of a rotating drum type workpiece washing apparatus (1), a first cylindrical body section (21), in which a liquid impassable part (21a) that follows the circumferential orientation and does not allow a washing solution to pass and a liquid passing part (21b) that allows the washing solution to pass are formed, is provided. With the rotation of a rotating drum (4), workpiece (w) is transported in the direction of the line of the central axis along the inner circumferential surface part on the lower side inside the rotating drum by spiral workpiece transport fins (8) formed along the inner circumferential surface inside the rotating drum. During transport with the rotation of the rotating drum (4), the washing configuration for the workpiece is switched from immersion washing to flowing water washing and shower washing in that order. The workpiece can be washed in different configurations; therefore, the washing effect on the workpiece can be increased by the rotating drum with the spiral workpiece transport fins.
摘要:
A rotating module (1) is provided with a pair of front and rear circular edge boards (2, 3) and a partition board (4) arranged in whorls from an outer circumference side to a center between the edge boards. The edge boards and the partition board form a whorl-like passage (15) extending in a direction orthogonally intersecting a central axis line (1a). An axis direction passage (17) is formed by a circular arc board part (7) on a center side of the partition board (4) and a feeding fin (8) spirally extending in a direction of the central axis line (1a) along an inner circumference plane (7a) of the circular arc board part. When a work is fed from a feeding port (16) at an outer circumference edge of the whorl-like passage (15) and a rotating module (1) is rotated, the work is fed to a center side along the whorl-like passage (15), fed to an ejection port (11) along the axis direction passage (17) by a feeding fine (8) and ejected. By using the rotating module (1), a work transporting apparatus, such as a short axis length compact multi-tank type inline cleaning apparatus, is provided.
摘要:
In one aspect, a spray cleaning apparatus (400, 500,600, 700) for components of an electronic device manufacturing process chamber includes: a support member (606, 702, 706); a spray nozzle (408, 608) attached to the support member; a cleaning chemistry supply (410, 604, 704); and a conduit (606, 706) adapted to convey cleaning chemistry from the cleaning chemistry supply to the spray nozzle; wherein the spray nozzle attached to the support member is adapted to rotate and/or to move linearly and is adapted to direct a spray of cleaning chemistry to the interior of an electronic device manufacturing process chamber component from a plurality of directions.