公开(公告)号：EP0542008B1

公开(公告)日：1998-08-12

申请号：EP92118070.9

申请日：1992-10-22

Applicant: SHIPLEY COMPANY INC.

Inventor： Thackeray, James W. ,  Orsula, George W.

IPC: G03F7/11 ,  G03F7/40 ,  G03F7/09

CPC classification number: G03F7/091 ,  G03F7/038 ,  G03F7/38

公开(公告)号：EP0462391A2

公开(公告)日：1991-12-27

申请号：EP91107484.7

申请日：1991-05-08

Applicant: SHIPLEY COMPANY INC.

Inventor： Thackeray, James W. ,  Orsula, George W. ,  Canistro, Dianne ,  McIlnay, Susan E.

IPC: G03F7/038 ,  G03F7/029

CPC classification number: G03F7/0295 ,  G03F7/038

Abstract: The invention is for a negative-acting, acid hardenable, deep UV photoresist comprising a phenolic resin having ring bonded hydroxyl sites, a thermally activated crosslinking agent that is an etherified aminoplast and a photoacid generator. The invention is characterized by control of the molar ratio of the ring bonded hydroxyl groups of the phenolic resin to the ether groups of the aminoplast which permits optimization of the properties such as optical absorbance, dissolution rate, photospeed, contrast, resolution and sidewall angle.

Abstract translation: 本发明涉及一种负性，酸可硬化的深UV光致抗蚀剂，其包含具有环键羟基位点的酚醛树脂，作为醚化氨基塑料的热活化交联剂和光酸产生剂。 本发明的特征在于控制酚醛树脂的环键羟基与氨基塑料的醚基团的摩尔比，其允许优化诸如光吸收率，溶解速率，感光速度，对比度，分辨率和侧壁角度的性质。