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38 条记录 (耗时 0.022 秒)

    KINETISCH STABILE CHLORIERTE POLYSILANE UND DEREN HERSTELLUNG UND VERWENDUNG
    18.
    发明公开
    KINETISCH STABILE CHLORIERTE POLYSILANE UND DEREN HERSTELLUNG UND VERWENDUNG 有权
    动力学稳定的氯化聚硅烷和其生产和使用

    公开(公告)号：EP2507296A1

    公开(公告)日：2012-10-10

    申请号：EP10787124.6

    申请日：2010-12-06

    申请人： Spawnt Private S.à.r.l.

    发明人： AUNER, Norbert ,  BAUCH, Christian ,  HOLL, Sven ,  DELTSCHEW, Rumen ,  MOHSSENI, Javad ,  LIPPOLD, Gerd ,  GEBEL, Thoralf

    IPC分类号： C08G77/60

    CPC分类号： C08G77/60 ,  C01B33/04 ,  C01G17/00 ,  C08G79/14 ,  Y02P20/582

    摘要： The invention relates to kinetically stable halogenated polysilanes as a mixture of compounds having respectively at least four silicon atoms which are bound together, the substituents thereof comprising chlorine, and chlorine and hydrogen, and in the composition thereof, the atomic ratio of substituent to silicon is at least 1:1, wherein a) said kinetically stable halogenated polysilanes have a kinetically high stability in relation to oxidative splitting by chlorine, and the degree of conversion at temperatures of 120 °C within 10 hours with an excess of chlorine gas at 1013 hPa does not exceed 30 mol %, and b) said kinetically stable halogenated polysilanes have a percentage of branching points in the polysilane molecules of more than 8 mol%, in particular more than 11 mol%. Said kinetically stable halogenated polysilanes offer novel uses compared to less stable conventional halogenated polysilanes.

    MIT SIC BESCHICHTETE KÖRPER UND VERFAHREN ZUR HERSTELLUNG SIC-BESCHICHTETER KÖRPER
    19.
    发明公开
    MIT SIC BESCHICHTETE KÖRPER UND VERFAHREN ZUR HERSTELLUNG SIC-BESCHICHTETER KÖRPER 有权
    与SIC涂覆体，及其制造方法SIC-覆盖本体

    公开(公告)号：EP2414558A1

    公开(公告)日：2012-02-08

    申请号：EP10712725.0

    申请日：2010-03-17

    申请人： Spawnt Private S.à.r.l. ,  Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

    发明人： ENDLER, Ingolf ,  HÖHN, Mandy ,  GEBEL, Thoralf ,  BAUCH, Christian ,  DELTSCHEW, Rumen ,  HOLL, Sven ,  LIPPOLD, Gerd ,  MOHSSENI-ALA, Seyed-Javad ,  AUNER, Norbert

    IPC分类号： C23C16/32 ,  C23C16/30

    CPC分类号： C23C16/325 ,  B32B18/00 ,  B82Y30/00 ,  C22C29/065 ,  C23C16/30 ,  Y10T428/264

    摘要： The invention relates to bodies, coated by a SiC hard material layer or by a layer system comprising at least one SiC hard material layer, and to a method for producing said type of coated bodies. The aim of the invention is to supply bodies with SiC layers that have a particle-free, non-porous structure, a high degree of hardness, low brittleness, high bond strength, good oxidation resistance and a high resistance to crack growth. According to the invention, the bodies are coated by a SiC layer or a multi-layer coating system comprising at least one SiC layer, wherein the SiC layer comprises nano-crystalline 3C-SiC comprising halogen or a mixed layer comprising nano-crystalline 3C-SiC comprising halogen and amorphous SiC or nano-crystalline 3C-SiC comprising halogen and amorphous carbon. The coating of said bodies is carried out in a thermal CVD process, wherein a gas mixture comprising H
    2 and/or one or more inert gases, one or more of the halogen polysilanes of the formulae Si
    n X
    2n , Si
    n X
    2n+2 , Si
    n X
    y H
    z , wherein X is the halogen and n ≥ 2 and one or more hydrocarbons is used. Alternatively according to the invention a gas mixture comprising one or more substituted halogen polysilanes having organic substitutes R of the general formulae Si
    n X
    y R
    z or Si
    n H
    x X
    y R
    z is used in H
    2 and/or one or more inert gases, wherein X is the halogen and n ≥ 2, z > 0, y ≥ 1. The stoichiometric ratios 2n+2 = y +z or 2n=y+z apply for Si
    n X
    y R
    z and the stochiometric ratios 2n+2 = x+y+z or 2n=x+y+z apply for Si
    n H
    x X
    y R
    z.